Optical constants of DC magnetron sputtered $TiO_2$ thin film have been determined by Spectroscopic Ellipsometry in the photon energy range 1.2 to 5.5 eV at room temperature. The measured dielectric-function spectra reveal distinct structures at energies of the E1, E1 + \bigtriangleup 1 and E2 critical points are due to interband transitions. The root mean square roughness of the magnetron sputtered $TiO_2$ thin films evaluated by ex-situ atomic force microscopy is 5.8 nm. The Dielectric constant values were found to be substantially lower than those for the bulk $TiO_2$. The dielectric related Optical constants, such as the refractive index, extinction coefficient, absorption coefficient and normal incidence of reflectivity determined from...
Titanium oxide (TiO2) thin films were deposited by DC magnetron sputtering of titanium target at var...
Optical constants of thin films in the vacuum ultraviolet spectral range are often not precisely kno...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
Optical constants of DC magnetron sputtered $TiO_2$ thin film have been determined by Spectroscopic ...
Titanum oxide and silicon oxide films were deposited on floatglass substrates by magnetron sputterin...
TiO2 thin films were deposited through a d. c. magnetron sputtering method. An analysis of the optic...
International audienceThin films of inorganic materials as Tin-doped indium oxide, titanium oxide, N...
[[abstract]]The Ti-doped TiO2 (TiO2:Ti) nanoceramic films were deposited by simultaneous rf magnetro...
We performed a comprehensive study on the electrochromism in TiO2 thin films made by reactive DC mag...
[[abstract]](TiO2)x – (Ta2O5)1 – x thin films were prepared with radio-frequency magnetron sputterin...
Titanium dioxide (TiO2) thin films were deposited on glass substrate by d.c. magnetron sputtering at...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...
Titanium dioxide (TiO(2)) films have been deposited on glass and p-silicon (1 0 0) substrates by DC ...
Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: convent...
We used spectroscopic ellipsometry to determine the optical constants of seven thin-film ThO2 sample...
Titanium oxide (TiO2) thin films were deposited by DC magnetron sputtering of titanium target at var...
Optical constants of thin films in the vacuum ultraviolet spectral range are often not precisely kno...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
Optical constants of DC magnetron sputtered $TiO_2$ thin film have been determined by Spectroscopic ...
Titanum oxide and silicon oxide films were deposited on floatglass substrates by magnetron sputterin...
TiO2 thin films were deposited through a d. c. magnetron sputtering method. An analysis of the optic...
International audienceThin films of inorganic materials as Tin-doped indium oxide, titanium oxide, N...
[[abstract]]The Ti-doped TiO2 (TiO2:Ti) nanoceramic films were deposited by simultaneous rf magnetro...
We performed a comprehensive study on the electrochromism in TiO2 thin films made by reactive DC mag...
[[abstract]](TiO2)x – (Ta2O5)1 – x thin films were prepared with radio-frequency magnetron sputterin...
Titanium dioxide (TiO2) thin films were deposited on glass substrate by d.c. magnetron sputtering at...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...
Titanium dioxide (TiO(2)) films have been deposited on glass and p-silicon (1 0 0) substrates by DC ...
Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: convent...
We used spectroscopic ellipsometry to determine the optical constants of seven thin-film ThO2 sample...
Titanium oxide (TiO2) thin films were deposited by DC magnetron sputtering of titanium target at var...
Optical constants of thin films in the vacuum ultraviolet spectral range are often not precisely kno...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...