Age hardening in (Ti1-xAlx)B2+Delta thin films

Thin films of (Ti0.71Al0.29)B2+1.08 have been deposited by magnetron sputtering. Post-deposition annealing at 1000 degrees C for 1 h results in increased hardness and elastic modulus, from 32 to 37 GPa and from 436 to 461 GPa, respectively. In both as-deposited and annealed states the films adhere well to the substrate, indicating no considerable internal stress. The initial high hardness is attributed to a columnar microstructure consisting of crystalline (Ti,Al)B-2 columns separated by an amorphous B matrix. The observed age hardening corresponds to phase separation within the (Ti,Al)B-2 columns including the formation of Ti-deficient crystallites within the grain interior upon annealing. (C) 2016 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.Funding Agencies|European Research Council under the European Community Seventh Framework Program (FP7)/ERC [258509]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [200900971]; Swedish Research Council (VR) [621-2012-4425, 642-2013-8020, 621-2011-4417, 330-2014-6336, 622-2008-405, 621-2012-4359]; SSF synergy grant FUNCASE; Knut and Mice Wallenberg (KAW) Foundation [2015.0043]