Combining micelle self-assembly with nanostencil lithography to create periodic/aperiodic micro-/nanopatterns on surfaces

A novel and flexible top‐down/bottom‐up scheme to achieve (sub‐)micrometer scale patterning of nanostructures with complementary micro‐/nanoarchitectures is presented. Nanostencils (perforated free‐standing Si3N4 membranes) are employed to pattern silicon nanopillars derived from the use of self‐assembled copolymer micelles as dry etch masks