International audienceIn this paper, a model of gate capacitance is proposed for ultrathin-body-BOX and double-gate MOSFETs with light mass channel materials. First, the model is derived by making the assumption that only one subband is occupied and using quantum perturbation theory to compute the corresponding energy level. Next, this model is confirmed with Poisson-Schrödinger simulations. Finally, the impacts in terms of performance and scaling are discussed
Abstract—Experimental gate capacitance (Cg) versus gate voltage data for InAs0.8Sb0.2 quantum-well M...
In this paper, the band-structure of ultra-thin body (UTB) double-gate (DG) MOSFETs is calculated by...
We report on the threshold voltage modeling of ultra-thin (1 nm-5 nm) silicon body double-gate (DG) ...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
We propose a compact model which predicts the channel charge density and the drain current which mat...
We propose a compact model which predicts the channel charge density and the drain current which mat...
This paper demonstrates the capability of our previously published undoped Double-Gate (DG) MOSFET e...
We investigate the quantization effects on the gate capacitance and charge distribution of a double ...
Nanotechnology Conference and Trade Show (Nanotech 2004), Boston, MA, MAR 07-11, 2004International a...
Nanotechnology Conference and Trade Show (Nanotech 2004), Boston, MA, MAR 07-11, 2004International a...
Bulk and novel MOSFET structures with gate-lengths in the 30nm regime are expected to become industr...
Double-Gate (DG) MOSFET is a newly emerging device that can potentially further scale down CMOS tech...
Double-Gate (DG) MOSFET is a newly emerging device that can potentially further scale down CMOS tech...
AbstractWe investigate the quantization effects on the gate capacitance and charge distribution of a...
Abstract—Experimental gate capacitance (Cg) versus gate voltage data for InAs0.8Sb0.2 quantum-well M...
In this paper, the band-structure of ultra-thin body (UTB) double-gate (DG) MOSFETs is calculated by...
We report on the threshold voltage modeling of ultra-thin (1 nm-5 nm) silicon body double-gate (DG) ...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
We propose a compact model which predicts the channel charge density and the drain current which mat...
We propose a compact model which predicts the channel charge density and the drain current which mat...
This paper demonstrates the capability of our previously published undoped Double-Gate (DG) MOSFET e...
We investigate the quantization effects on the gate capacitance and charge distribution of a double ...
Nanotechnology Conference and Trade Show (Nanotech 2004), Boston, MA, MAR 07-11, 2004International a...
Nanotechnology Conference and Trade Show (Nanotech 2004), Boston, MA, MAR 07-11, 2004International a...
Bulk and novel MOSFET structures with gate-lengths in the 30nm regime are expected to become industr...
Double-Gate (DG) MOSFET is a newly emerging device that can potentially further scale down CMOS tech...
Double-Gate (DG) MOSFET is a newly emerging device that can potentially further scale down CMOS tech...
AbstractWe investigate the quantization effects on the gate capacitance and charge distribution of a...
Abstract—Experimental gate capacitance (Cg) versus gate voltage data for InAs0.8Sb0.2 quantum-well M...
In this paper, the band-structure of ultra-thin body (UTB) double-gate (DG) MOSFETs is calculated by...
We report on the threshold voltage modeling of ultra-thin (1 nm-5 nm) silicon body double-gate (DG) ...