In order to obtain reliable multilevel cell (MLC) characteristics, resistance controllability between the different resistance levels is required especially in resistive random access memory (RRAM), which is prone to resistance variability mainly due to its intrinsic random nature of defect generation and filament formation. In this study, we have thoroughly investigated the multilevel resistance variability in a TaOx-based nanoscale (<30 nm) RRAM operated in MLC mode. It is found that the resistance variability not only depends on the conductive filament size but also is a strong function of oxygen vacancy concentration in it. Based on the gained insights through experimental observations and simulation, it is suggested that forming thinne...
Resistive random–access memory (RRAM) for neuromorphic systems has received significant attention be...
A new technical improvement in understanding the resistive switching characteristics of unipolar res...
© 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for a...
International audienceIn order to obtain reliable multilevel cell (MLC) characteristics, resistance ...
The increasing demand on memory from the next-generation technologies facilitated the pathfinding an...
An atomistic Monte-Carlo simulator is developed for TaOx-based resistive switching random access mem...
With the explosive growth of digital data in the era of the Internet of Things (IoT), fast and scala...
Multilevel per cell (MLC) storage in resistive random access memory (ReRAM) is attractive in achievi...
Considerable efforts have been made to obtain better control of the switching behavior of resistive ...
Memory unit, especially the non-volatile memory (NVM), is an indispensable component in a high perfo...
The switching uniformity and reliability of the TaOx based resistive random access memory (RRAM) dev...
esistive random access memory (RRAM) has been attracting attention for high-density, high-speed, and...
Abstract Variability in resistive random access memory cell has been one of the critical challenges ...
For the first time, we report that the resistive switching behaviors of the multi-level resistance s...
A theory is presented which describes the variability of multilevel switching in scaled hybrid resis...
Resistive random–access memory (RRAM) for neuromorphic systems has received significant attention be...
A new technical improvement in understanding the resistive switching characteristics of unipolar res...
© 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for a...
International audienceIn order to obtain reliable multilevel cell (MLC) characteristics, resistance ...
The increasing demand on memory from the next-generation technologies facilitated the pathfinding an...
An atomistic Monte-Carlo simulator is developed for TaOx-based resistive switching random access mem...
With the explosive growth of digital data in the era of the Internet of Things (IoT), fast and scala...
Multilevel per cell (MLC) storage in resistive random access memory (ReRAM) is attractive in achievi...
Considerable efforts have been made to obtain better control of the switching behavior of resistive ...
Memory unit, especially the non-volatile memory (NVM), is an indispensable component in a high perfo...
The switching uniformity and reliability of the TaOx based resistive random access memory (RRAM) dev...
esistive random access memory (RRAM) has been attracting attention for high-density, high-speed, and...
Abstract Variability in resistive random access memory cell has been one of the critical challenges ...
For the first time, we report that the resistive switching behaviors of the multi-level resistance s...
A theory is presented which describes the variability of multilevel switching in scaled hybrid resis...
Resistive random–access memory (RRAM) for neuromorphic systems has received significant attention be...
A new technical improvement in understanding the resistive switching characteristics of unipolar res...
© 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for a...