Add to ORKGCopper aluminum oxide films were prepared by direct current (dc) reactive magnetron sputtering under various substrate temperatures in the range of 303–648 K and systematically studied their physical properties. The physical properties of the films were strongly affected by the substrate temperature. The films formed at substrate temperatures <373 K were amorphous while those deposited at higher substrate temperatures (≥373 K) were polycrystalline in nature. The electrical properties of the films enhanced with substrate temperature due to the improved crystallinity. The Hall mobility of 9.4 cm2/V s and carrier concentration of 3.5 × 1017 cm−3 were obtained at the substrate temperature of 573 K. The optical band gap of the films decreased fr...
dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on qu...
The structure and morphology of Cu films deposited by DC magnetron sputtering on silicon and stainle...
International Conference on Nanoscience and Nanotechnology, Lucknow, INDIA, NOV 18-20, 2013Internati...
For the first time, Cu-Al-O films were grown using the reactive ion beam sputtering at temperatures ...
Copper oxide thin films are deposited on quartz substrates by DC magnetron sputtering and the effect...
The structural and electrical properties of a low resistivity CuAlMo thin film resistor material wer...
[[abstract]]This article reports the structure and optoelectronic properties of p-type CuAlO2 films....
In this thesis, we investigate the development of phase-pure CuAlO2 film. CuAlO2 films were deposite...
In this paper, copper oxide (CuO) thin films were deposited on polyimide plastic substrates by...
International audienceCu-Cr-O thin films were co-sputtered from metallic Cu and Cr targets in the pr...
The formation of p-type Cu-Al-O thin films has been studied and their optical and electrical propert...
CuAlO2 and CuAl2O4 thin films were synthesized by the deposition of the precursor metals using the p...
[[abstract]]Annealed Cu-Al-O films showed marked structural changes and differing optoelectronic pro...
Transparent and conductive p-type oxide films are building blocks for the rising field of transparen...
Applications of copper (Cu) thin films have emerged from microelectronics to nanotechnology. The pri...
dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on qu...
The structure and morphology of Cu films deposited by DC magnetron sputtering on silicon and stainle...
International Conference on Nanoscience and Nanotechnology, Lucknow, INDIA, NOV 18-20, 2013Internati...
For the first time, Cu-Al-O films were grown using the reactive ion beam sputtering at temperatures ...
Copper oxide thin films are deposited on quartz substrates by DC magnetron sputtering and the effect...
The structural and electrical properties of a low resistivity CuAlMo thin film resistor material wer...
[[abstract]]This article reports the structure and optoelectronic properties of p-type CuAlO2 films....
In this thesis, we investigate the development of phase-pure CuAlO2 film. CuAlO2 films were deposite...
In this paper, copper oxide (CuO) thin films were deposited on polyimide plastic substrates by...
International audienceCu-Cr-O thin films were co-sputtered from metallic Cu and Cr targets in the pr...
The formation of p-type Cu-Al-O thin films has been studied and their optical and electrical propert...
CuAlO2 and CuAl2O4 thin films were synthesized by the deposition of the precursor metals using the p...
[[abstract]]Annealed Cu-Al-O films showed marked structural changes and differing optoelectronic pro...
Transparent and conductive p-type oxide films are building blocks for the rising field of transparen...
Applications of copper (Cu) thin films have emerged from microelectronics to nanotechnology. The pri...
dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on qu...
The structure and morphology of Cu films deposited by DC magnetron sputtering on silicon and stainle...
International Conference on Nanoscience and Nanotechnology, Lucknow, INDIA, NOV 18-20, 2013Internati...