Multilayers of Ni and Al of 10 nm periodicity have been sequentially deposited by RF sputtering. Only elemental Ni and Al were present in the as-deposited samples. No phase formation was detected until 673 K. For samples heated to 873 K, TEM studies reveal the presence of large grains of $Al_3Ni$ (confirmed with large systematic tilts) and equiaxed nanocrystals of $Al_3Ni$. In addition to the reflections from these two phases, the samples contain additional reflections with streaking from an additional phase. Imaging with these reflections reveals domains with probably strain modulations. Small elongated precipitates of $Al_3Ni$ are also occasionally present in the $Al_3Ni$ matrix. The origin of this complex microstructure is discussed
Two phase granular thin films are of great current interest. These have wide applications in the dev...
In this work, the authors have used an unconventional experimental route that consists of (i) deposi...
International audienceIn this paper we describe the alloying process of ultra-thin Al layers (below ...
The Ni/Al multilayer coating of λ ≈100 nm was deposited onto (001)-oriented monocrystalline silicon ...
Multilayers of Ni and Al of 1:1 ratio, 50 nm periodicity, were deposited using sputtering. Progress ...
Multilayers of Ni and Al of 1:1 ratio, 50 nm periodicity, were deposited using sputtering. Progress ...
4 pagesAl/Ni multilayers have been prepared by repeated folding and cold rolling (F&R) of elemental ...
Reactive multilayer systems represent an innovative approach for potential usage in chip joining app...
n this work the effects of prolonged heat treatments on the microstructural and crystallographic evo...
Intermetallic Ni3Al has been deposited by means of magnetron sputtering on substrates with an amorph...
Intermetallic thin films of stoichiometric NiAl and Ni3Al have been deposited onto n-type silicon (1...
Thin films of Al-50 at.% Ni composition were deposited by laser ablation technique on single crystal...
5 pages. Can also be found at : http://www.epjap.org/action/displayAbstract?fromPage=online&aid=8011...
International audienceThe early stages of devitrification of Al89 Ni6 La5 metallic glass were invest...
Two phase granular thin films are of great current interest. These have wide applications in the dev...
In this work, the authors have used an unconventional experimental route that consists of (i) deposi...
International audienceIn this paper we describe the alloying process of ultra-thin Al layers (below ...
The Ni/Al multilayer coating of λ ≈100 nm was deposited onto (001)-oriented monocrystalline silicon ...
Multilayers of Ni and Al of 1:1 ratio, 50 nm periodicity, were deposited using sputtering. Progress ...
Multilayers of Ni and Al of 1:1 ratio, 50 nm periodicity, were deposited using sputtering. Progress ...
4 pagesAl/Ni multilayers have been prepared by repeated folding and cold rolling (F&R) of elemental ...
Reactive multilayer systems represent an innovative approach for potential usage in chip joining app...
n this work the effects of prolonged heat treatments on the microstructural and crystallographic evo...
Intermetallic Ni3Al has been deposited by means of magnetron sputtering on substrates with an amorph...
Intermetallic thin films of stoichiometric NiAl and Ni3Al have been deposited onto n-type silicon (1...
Thin films of Al-50 at.% Ni composition were deposited by laser ablation technique on single crystal...
5 pages. Can also be found at : http://www.epjap.org/action/displayAbstract?fromPage=online&aid=8011...
International audienceThe early stages of devitrification of Al89 Ni6 La5 metallic glass were invest...
Two phase granular thin films are of great current interest. These have wide applications in the dev...
In this work, the authors have used an unconventional experimental route that consists of (i) deposi...
International audienceIn this paper we describe the alloying process of ultra-thin Al layers (below ...