In this paper, a novel modeling framework is proposed to quickly estimate the delay variability of logic paths due to random variations, and evaluate the related design margin. The analysis shows that the popular fan-out-of-4 metric F04 can capture the impact of technology and voltage on the delay variations of logic paths. Once those contributions are isolated, the impact of random variations on standard cells' delay is accounted for by means of cell-specific coefficients that are evaluated in a preliminary library characterization phase. The proposed framework is very general and applicable from sub-threshold to nominal voltage, and provides the designer with a deep insight into the main delay variability contributions in a path. It also ...
In this paper, the effect of process variations on the delay is analyzed in depth for the static and...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
With the continued scaling of chip manufacturing technologies, the significance of process variation...
In this paper, a novel framework is introduced to estimate the max-delay variability in logic paths ...
A simple metric is presented for the accurate prediction of path delay variability within digital ci...
A simple metric is presented for the accurate prediction of path delay variability during the autom...
A physical yet compact gate delay model is developed integrating short-channel effects and the Alpha...
This thesis focuses on random local delay variability measurement and its modeling. It explains a ci...
The continued scaling of digital integrated circuits has led to an increasingly larger impact of pro...
In nanoscale digital CMOS IC design, the large technology parameter variations have boosted the inte...
Under manufacturing process variation, the circuit delay varies with process parameters. For delay t...
Standard low power design utilizes a variety of approaches for supply and threshold control to reduc...
In this paper, some of the most practically interesting Full Adder topologies are analyzed in terms ...
Abstract—In nanoscale CMOS circuits the random dopant fluc-tuations (RDF) cause significant threshol...
The growing impact of process variation on circuit performance requires statistical design approache...
In this paper, the effect of process variations on the delay is analyzed in depth for the static and...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
With the continued scaling of chip manufacturing technologies, the significance of process variation...
In this paper, a novel framework is introduced to estimate the max-delay variability in logic paths ...
A simple metric is presented for the accurate prediction of path delay variability within digital ci...
A simple metric is presented for the accurate prediction of path delay variability during the autom...
A physical yet compact gate delay model is developed integrating short-channel effects and the Alpha...
This thesis focuses on random local delay variability measurement and its modeling. It explains a ci...
The continued scaling of digital integrated circuits has led to an increasingly larger impact of pro...
In nanoscale digital CMOS IC design, the large technology parameter variations have boosted the inte...
Under manufacturing process variation, the circuit delay varies with process parameters. For delay t...
Standard low power design utilizes a variety of approaches for supply and threshold control to reduc...
In this paper, some of the most practically interesting Full Adder topologies are analyzed in terms ...
Abstract—In nanoscale CMOS circuits the random dopant fluc-tuations (RDF) cause significant threshol...
The growing impact of process variation on circuit performance requires statistical design approache...
In this paper, the effect of process variations on the delay is analyzed in depth for the static and...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
With the continued scaling of chip manufacturing technologies, the significance of process variation...