| openaire: EC/H2020/339478/EU//LAYERENG-HYBMATIron terephthalate coordination network thin films can be fabricated using the state-of-the-art gas-phase atomic/molecular layer deposition (ALD/MLD) technique in a highly controlled manner. Iron is an Earth-abundant and nonhazardous transition metal, and with its rich variety of potential applications an interesting metal constituent for the inorganic-organic coordination network films. Our work underlines the role of the metal precursor used when aiming at in-situ ALD/MLD growth of crystalline inorganic-organic thin films. We obtain crystalline iron terephthalate films when FeCl3 is employed as the iron source whereas depositions based on the bulkier Fe(acac)3 precursor yield amorphous films....
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATControlled molecular deposition of natural organic mole...
ABSTRACT: Atomic layer deposition (ALD) has been shown to be an excellent method for depositing thin...
| openaire: EC/H2020/765378/EU//HYCOATWe present a new type of atomic layer deposition (ALD) process...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATWe present novel atomic/molecular layer deposition (ALD...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATCrystalline inorganic-organic coordination network mate...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMAT Funding Information: This work has received funding fr...
A new divalent Fe precursor has been explored for deposition of iron-containing thin films by atomic...
| openaire: EC/H2020/339478/EU//LAYERENG-HYBMATThe combined atomic and molecular layer deposition (A...
| openaire: EC/H2020/339478/EU//LAYERENG-HYBMATThe atomic/molecular layer deposition (ALD/MLD) techn...
We acknowledge the funding from Academy of Finland (Profi 3), and the use of the RawMatTERS Finland ...
Here we report the growth of novel transition metal-organic thin-film materials consisting of mangan...
Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)tere...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATThe possibility to deposit purely organic and hybrid in...
Funding Information: The authors would like to thank the Academy of Finland (Profi 3 and 5 projects)...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATThe gas-phase atomic/molecular layer deposition (ALD/ML...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATControlled molecular deposition of natural organic mole...
ABSTRACT: Atomic layer deposition (ALD) has been shown to be an excellent method for depositing thin...
| openaire: EC/H2020/765378/EU//HYCOATWe present a new type of atomic layer deposition (ALD) process...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATWe present novel atomic/molecular layer deposition (ALD...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATCrystalline inorganic-organic coordination network mate...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMAT Funding Information: This work has received funding fr...
A new divalent Fe precursor has been explored for deposition of iron-containing thin films by atomic...
| openaire: EC/H2020/339478/EU//LAYERENG-HYBMATThe combined atomic and molecular layer deposition (A...
| openaire: EC/H2020/339478/EU//LAYERENG-HYBMATThe atomic/molecular layer deposition (ALD/MLD) techn...
We acknowledge the funding from Academy of Finland (Profi 3), and the use of the RawMatTERS Finland ...
Here we report the growth of novel transition metal-organic thin-film materials consisting of mangan...
Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)tere...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATThe possibility to deposit purely organic and hybrid in...
Funding Information: The authors would like to thank the Academy of Finland (Profi 3 and 5 projects)...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATThe gas-phase atomic/molecular layer deposition (ALD/ML...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATControlled molecular deposition of natural organic mole...
ABSTRACT: Atomic layer deposition (ALD) has been shown to be an excellent method for depositing thin...
| openaire: EC/H2020/765378/EU//HYCOATWe present a new type of atomic layer deposition (ALD) process...