Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity

FERNANDEZ, FELIX EUGENIO.
FERNANDEZ, FELIX EUGENIO.

January 1987

Current technology has made possible the fabrication of multilayered optical elements for soft x-ray...

Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors

Stock, HJ
Hamelmann, Frank
Kleineberg, U
Menke, D
Schmiedeskamp, B
Osterried, K
Heidemann, KF
Heinzmann, Ulrich

January 1997

Stock HJ, Hamelmann F, Kleineberg U, et al. Carbon buffer layers for smoothing superpolished glass s...

Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density

Schlatmann, R.
Keppel, A.
Xue, Y.
Verhoeven, J.
van der Wiel, M. J.

January 1993

We report a significant increase of the reflectivity of a soft x-ray Mo/Si multilayer mirror after l...

Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation

Stock, H. J.
Kleineberg, U.
Heidemann, B.
Hilgers, K.
Kloidt, A.
Schmiedeskamp, B.
Heinzmann, Ulrich
Krumrey, M.
Müller, P.
Scholze, F.

January 1994

Stock HJ, Kleineberg U, Heidemann B, et al. Thermal stability of Mo/Si multilayer soft-X-ray mirrors...

Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment

Kloidt, A.
Nolting, K.
Kleineberg, U.
Schmiedeskamp, B.
Heinzmann, Ulrich
Müller, P.
Kühne, M.

January 1991

Kloidt A, Nolting K, Kleineberg U, et al. Enhancement of the reflectivity of Mo/Si multilayer x-ray ...

ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS

SCHMIEDESKAMP, B
KLOIDT, A
STOCK, HJ
KLEINEBERG, U
DOHRING, T
PROPPER, M
RAHN, S
HILGERS, K
HEIDEMANN, B
TAPPE, T
Heinzmann, Ulrich
KRUMREY, MK
MULLER, P
SCHOLZE, F
HEIDEMANN, KF

January 1994

SCHMIEDESKAMP B, KLOIDT A, STOCK HJ, et al. ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAY...

Roentgenoptische Komponenten auf Multilayerbasis Abschlussbericht

Mai, H.
Dietsch, R.
Holz, T.
Schoeneich, B.
Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (IWS), Dresden (Germany)

January 1995

Multilayer systems designed as optical components in the soft X-ray range were fabricated by electro...

Fabrication and characterization of Si-based soft x-ray mirrors

Schmiedeskamp, B.
Heidemann, B.
Kleineberg, U.
Kloidt, A.
Kühne, M.
Müller, H.
Müller, P.
Nolting, K.
Heinzmann, Ulrich
Hoover, Richard B.

January 1991

Schmiedeskamp B, Heidemann B, Kleineberg U, et al. Fabrication and characterization of Si-based soft...

Thermal stability of Mo/Si multilayers

Rosen, R.S.
Stearns, D.G. (Lawrence Livermore National Lab., CA (United States))
Viliardos, M.A.
Kassner, M.E. (Oregon State Univ., Corvallis, OR (United States). Dept. of Mechanical Engineering)
Vernon, S.P. (Vernon Applied Physics, Torrance, CA (United States))

July 1991

The thermal stability of Mo/Si multilayers for x-ray mirror applications was investigated by anneali...

Fabrication, thermal stability and reflectivity measurements of Mo/Si-multilayers as X-ray mirrors and other optical components

Kloidt, A.
Stock, H.J.
Kleineberg, U.
Döhring, T.
Pröpper, M.
Nolting, K.
Heidemann, B.
Tappe, T.
Schmiedeskamp, B.
Heinzmann, Ulrich
Krumrey, M.
Müller, P.
Scholze, F.
Rahn, S.
Hormes, J.
Heidemann, K.F.

January 1992

Kloidt A, Stock HJ, Kleineberg U, et al. Fabrication, thermal stability and reflectivity measurement...

Determination of layer structure in Mo/Si multilayers using soft X-ray reflectivity

M. H. Modi

January 2003

The soft X-ray reflectivity characterization of Mo/Si multilayer deposited by electron beam evaporat...

Magnetron sputtered EUV mirrors with high thermal stability

Feigl, T.
Yulin, S.
Kaiser, N.
Thielsch, R.

January 2000

Many applications of multilayers in the EUV spectral region require not only high normal incidence r...

Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment

Kloidt, A.
Stock, H. J.
Kleineberg, U.
Döhring, T.
Pröpper, M.
Schmiedeskamp, B.
Heinzmann, Ulrich

January 1993

Kloidt A, Stock HJ, Kleineberg U, et al. Smoothing of interfaces in ultrathin Mo/Si multilayers by i...

EUV multilayer mirrors with enhanced stability

Benoit, N.
Yulin, S.
Feigl, T.
Kaiser, N.

January 2006

The application of multilayer optics in EUV lithography requires not only the highest possible norma...

High-temperature multilayers

Yulin, S.
Benoit, N.
Feigl, T.
Kaiser, N.

January 2005

The effect of elevated temperatures on the optical and structural stability of MoSi2/Si and Mo/C/Si/...

MULTILAYER REFLECTORS FOR SOFT X-RAYS.

FERNANDEZ, FELIX EUGENIO.
FERNANDEZ, FELIX EUGENIO.

January 1987

Current technology has made possible the fabrication of multilayered optical elements for soft x-ray...

Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors

Stock, HJ
Hamelmann, Frank
Kleineberg, U
Menke, D
Schmiedeskamp, B
Osterried, K
Heidemann, KF
Heinzmann, Ulrich

January 1997

Stock HJ, Hamelmann F, Kleineberg U, et al. Carbon buffer layers for smoothing superpolished glass s...

Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density

Schlatmann, R.
Keppel, A.
Xue, Y.
Verhoeven, J.
van der Wiel, M. J.

January 1993

We report a significant increase of the reflectivity of a soft x-ray Mo/Si multilayer mirror after l...

Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation

Stock, H. J.
Kleineberg, U.
Heidemann, B.
Hilgers, K.
Kloidt, A.
Schmiedeskamp, B.
Heinzmann, Ulrich
Krumrey, M.
Müller, P.
Scholze, F.

January 1994

Stock HJ, Kleineberg U, Heidemann B, et al. Thermal stability of Mo/Si multilayer soft-X-ray mirrors...

Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment

Kloidt, A.
Nolting, K.
Kleineberg, U.
Schmiedeskamp, B.
Heinzmann, Ulrich
Müller, P.
Kühne, M.

January 1991

Kloidt A, Nolting K, Kleineberg U, et al. Enhancement of the reflectivity of Mo/Si multilayer x-ray ...

ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS

SCHMIEDESKAMP, B
KLOIDT, A
STOCK, HJ
KLEINEBERG, U
DOHRING, T
PROPPER, M
RAHN, S
HILGERS, K
HEIDEMANN, B
TAPPE, T
Heinzmann, Ulrich
KRUMREY, MK
MULLER, P
SCHOLZE, F
HEIDEMANN, KF

January 1994

SCHMIEDESKAMP B, KLOIDT A, STOCK HJ, et al. ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAY...

Roentgenoptische Komponenten auf Multilayerbasis Abschlussbericht

Mai, H.
Dietsch, R.
Holz, T.
Schoeneich, B.
Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (IWS), Dresden (Germany)

January 1995

Multilayer systems designed as optical components in the soft X-ray range were fabricated by electro...

Fabrication and characterization of Si-based soft x-ray mirrors

Schmiedeskamp, B.
Heidemann, B.
Kleineberg, U.
Kloidt, A.
Kühne, M.
Müller, H.
Müller, P.
Nolting, K.
Heinzmann, Ulrich
Hoover, Richard B.

January 1991

Schmiedeskamp B, Heidemann B, Kleineberg U, et al. Fabrication and characterization of Si-based soft...

Thermal stability of Mo/Si multilayers

Rosen, R.S.
Stearns, D.G. (Lawrence Livermore National Lab., CA (United States))
Viliardos, M.A.
Kassner, M.E. (Oregon State Univ., Corvallis, OR (United States). Dept. of Mechanical Engineering)
Vernon, S.P. (Vernon Applied Physics, Torrance, CA (United States))

July 1991

The thermal stability of Mo/Si multilayers for x-ray mirror applications was investigated by anneali...

Fabrication, thermal stability and reflectivity measurements of Mo/Si-multilayers as X-ray mirrors and other optical components

Kloidt, A.
Stock, H.J.
Kleineberg, U.
Döhring, T.
Pröpper, M.
Nolting, K.
Heidemann, B.
Tappe, T.
Schmiedeskamp, B.
Heinzmann, Ulrich
Krumrey, M.
Müller, P.
Scholze, F.
Rahn, S.
Hormes, J.
Heidemann, K.F.

January 1992

Kloidt A, Stock HJ, Kleineberg U, et al. Fabrication, thermal stability and reflectivity measurement...

Determination of layer structure in Mo/Si multilayers using soft X-ray reflectivity

M. H. Modi

January 2003

The soft X-ray reflectivity characterization of Mo/Si multilayer deposited by electron beam evaporat...

Magnetron sputtered EUV mirrors with high thermal stability

Feigl, T.
Yulin, S.
Kaiser, N.
Thielsch, R.

January 2000

Many applications of multilayers in the EUV spectral region require not only high normal incidence r...

Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment

Kloidt, A.
Stock, H. J.
Kleineberg, U.
Döhring, T.
Pröpper, M.
Schmiedeskamp, B.
Heinzmann, Ulrich

January 1993

Kloidt A, Stock HJ, Kleineberg U, et al. Smoothing of interfaces in ultrathin Mo/Si multilayers by i...

EUV multilayer mirrors with enhanced stability

Benoit, N.
Yulin, S.
Feigl, T.
Kaiser, N.

January 2006

The application of multilayer optics in EUV lithography requires not only the highest possible norma...

High-temperature multilayers

Yulin, S.
Benoit, N.
Feigl, T.
Kaiser, N.

January 2005

The effect of elevated temperatures on the optical and structural stability of MoSi2/Si and Mo/C/Si/...

MULTILAYER REFLECTORS FOR SOFT X-RAYS.

FERNANDEZ, FELIX EUGENIO.
FERNANDEZ, FELIX EUGENIO.

January 1987

Current technology has made possible the fabrication of multilayered optical elements for soft x-ray...

Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors

Stock, HJ
Hamelmann, Frank
Kleineberg, U
Menke, D
Schmiedeskamp, B
Osterried, K
Heidemann, KF
Heinzmann, Ulrich

January 1997

Stock HJ, Hamelmann F, Kleineberg U, et al. Carbon buffer layers for smoothing superpolished glass s...

Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density

Schlatmann, R.
Keppel, A.
Xue, Y.
Verhoeven, J.
van der Wiel, M. J.

January 1993

We report a significant increase of the reflectivity of a soft x-ray Mo/Si multilayer mirror after l...

Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity

Abstract

Extracted data

Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity

Abstract

Extracted data

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