Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication

Novel acrylamide-based hard-soft hybrid block copolymers generate high-quality nanolithographic patterns satisfying high-resolution, long-range ordering, low defect density, moderate etch selectivity, and easy pattern transfer onto a substrate. The resulting patterns can also be used as a scaffold for metallic nanostructures such as aligned nanowires and nanomeshes with extraordinary structural regularity.This research was funded by the Corporate R&D, LG Chem, Ltd., and also supported in part by the National Research Foundation of Korea (NRF) Grant (2010-0020973). The X-ray experiments at PAL were supported in part by MEST and POSTECH. The authors acknowledge Professor Sang Ouk Kim at KAIST for his valuable discussions. J.G.L. thanks financial support by a Seoul Science Fellowship through the Seoul Metropolitan Government and by Hanyang University