Haase T, Kohse-Höinghaus K, Bahlawane N, Djiele P, Jakob A, Lang H. CVD with Tri-(n)butylphosphine silver(I) complexes: Mass spectrometric investigations and depositions. CHEMICAL VAPOR DEPOSITION. 2005;11(4):195-205.Tri-(n)butylphosphine silver(I) complexes were synthesized and characterized with respect to their suitability for the CVD of silver thin films. The volatility and thermal stability of these complexes were investigated using temperature-programmed and in-situ mass spectrometry (MS). Complexes with smaller carboxylate ligands showed superior long-term stability and had the advantage of evaporation without decomposition. Careful examination of the fragments detected during evaporation and in a CVD reactor allowed us to propose th...
The deposition of metal thin films can be undertaken using volatile organometallic complexes. Metal-...
Abstract. Among a variety of applications of organometahc compounds, their use as MOCVD precursors i...
Among a variety of applications of organometallic compounds, their use as MOCVD precursors is one of...
Haase T, Kohse-Höinghaus K, Atakan B, Schmidt H, Lang H. Gas phase study of systems for the CVD of s...
Silver(I) complexes of type LnAgX (X = organic ligand, such as carboxylates, dicarboxylates, Schiff-...
textWith the growing demand for miniaturization of devices and for new materials with useful propert...
Bahlawane N, Premkumar PA, Brechling A, Reiss G, Kohse-Höinghaus K. Alcohol-assisted CVD of silver u...
Schmidt H, Jakob A, Haase T, et al. Bu3P-Silber(I)-ß-Diketonate: Synthese, Gasphasenuntersuchungen u...
Lang H, Jakob A, Schmidt H, et al. Phosphane and phosphite silver(I) complexes as CVD precursors. In...
The new mixed ligand complex [(n-Bu3P)Ag((CH3)3CCOO)] (I) is suggested as precursor for MOCVD of Ag ...
A comparative study of vacuum versus ambient pressure inert gas thermogravimetry was performed on si...
Premkumar PA, Bahlawane N, Reiss G, Kohse-Höinghaus K. CVD of metals using alcohols and metal acetyl...
International audienceApplication of mass spectrometry (MS) for the investigation of metal-organic (...
A chemistry-based approach to designing precursors for the CVD of inorganic films1 requires consider...
Dimeric silver(I) and gold(I) <i>tert</i>-butyl-imino-2,2-dimethylpyrrolidinates were synthesized ...
The deposition of metal thin films can be undertaken using volatile organometallic complexes. Metal-...
Abstract. Among a variety of applications of organometahc compounds, their use as MOCVD precursors i...
Among a variety of applications of organometallic compounds, their use as MOCVD precursors is one of...
Haase T, Kohse-Höinghaus K, Atakan B, Schmidt H, Lang H. Gas phase study of systems for the CVD of s...
Silver(I) complexes of type LnAgX (X = organic ligand, such as carboxylates, dicarboxylates, Schiff-...
textWith the growing demand for miniaturization of devices and for new materials with useful propert...
Bahlawane N, Premkumar PA, Brechling A, Reiss G, Kohse-Höinghaus K. Alcohol-assisted CVD of silver u...
Schmidt H, Jakob A, Haase T, et al. Bu3P-Silber(I)-ß-Diketonate: Synthese, Gasphasenuntersuchungen u...
Lang H, Jakob A, Schmidt H, et al. Phosphane and phosphite silver(I) complexes as CVD precursors. In...
The new mixed ligand complex [(n-Bu3P)Ag((CH3)3CCOO)] (I) is suggested as precursor for MOCVD of Ag ...
A comparative study of vacuum versus ambient pressure inert gas thermogravimetry was performed on si...
Premkumar PA, Bahlawane N, Reiss G, Kohse-Höinghaus K. CVD of metals using alcohols and metal acetyl...
International audienceApplication of mass spectrometry (MS) for the investigation of metal-organic (...
A chemistry-based approach to designing precursors for the CVD of inorganic films1 requires consider...
Dimeric silver(I) and gold(I) <i>tert</i>-butyl-imino-2,2-dimethylpyrrolidinates were synthesized ...
The deposition of metal thin films can be undertaken using volatile organometallic complexes. Metal-...
Abstract. Among a variety of applications of organometahc compounds, their use as MOCVD precursors i...
Among a variety of applications of organometallic compounds, their use as MOCVD precursors is one of...