Functionalization of a Self-Assembled Monolayer Driven by Low-Energy Electron Exposure

Hamann T, Kankate L, Boehler E, et al. Functionalization of a Self-Assembled Monolayer Driven by Low-Energy Electron Exposure. Langmuir. 2012;28(1):367-376.Self-assembled monolayers (SAMs) of 10-undecene-l-thiol on Au were functionafized with nitrogen-containing groups using an approach in which multilayer ammonia (NH(3)) films were deposited at low temperature onto the SAMs and subsequently exposed to 15 eV electrons. The result of this process was investigated after removal of the remaining NH(3) by annealing to room temperature using high-resolution electron energy loss spectroscopy (HREELS) and X-ray photoelectron spectroscopy (XPS). HREELS shows that the CC double bonds disappear during electron exposure, while XPS gives evidence that about 25% of the terminal double bonds of the SAM were functionalized. Also, XPS shows that a sufficiently thick NH(3) layer protects the underlying SAM from electron-induced damage. The process suggested here thus represents a particularly gentle approach to the functionalization of ultrathin molecular layers. Thermal desorption spectrometry (TDS) and electron-stimulated desorption (ESD) experiments on condensed layers of NH(3) reveal production of N(2) but show that significant amounts of the initial NH3 as well as N(2) produced during electron exposure desorb. Hydrogen released upon formation of N2 is held responsible for the reduction of double bonds and protection of the SAMs from damage