Add to ORKGThis contribution deals with design, check and test of deposition parameters for new installed aluminium target. In addition of individual parts of deposition process and hysteresis of sputtering thin films of Al2O3 was verified. This made it possible to determine borders of reactive and metallic mode. The designed borders were created technological window for sputtering Al2O3 films. The sputtered thin films are tested on mechanical, optical properties and adhesion
In the further development of reactive sputter deposition, strategies which allow for stabilization ...
Many reactive sputter deposition applications require high deposition rates. The primary limiting pa...
Reactive sputtering is one of the widely used techniques to prepare compound thin films. In this stu...
This contribution deals with design, check and test of deposition parameters for new installed alumi...
Diploma thesis describes technology of pulse reactive magnetron sputtering of Al2O3 coating. Further...
The high optical characteristics of aluminium films made them attractive for different functional an...
It has been shown already that pulsed reactive magnetron sputtering (PMS) allows to deposit crystall...
The deposition rate of reactively sputtered Al2O3 coatings is demonstrated to increase by 80% upon t...
Alumina (Al2O3) thin films were deposited on Si (100) by Magnetron Sputtering in reactive conditions...
International audienceThe deposition rate of reactively sputtered Al2O3 coatings is demonstrated to ...
International audiencen this work, AlNxOy thin films were deposited by reactive magnetron sputtering...
Thin films of Al2O3 and AlN have been fabricated by reactive sputtering using magnetron sputtering e...
Aluminum oxide thin films were prepared by medium frequency reactive magnetron sputtering. The targe...
Aluminum oxide is used in many applications as hard coating, for example on cutting tools. In additi...
Al and Al2O3 films were deposited by RF magnetron sputtering using a mixed gas of Ar and O2. The sur...
In the further development of reactive sputter deposition, strategies which allow for stabilization ...
Many reactive sputter deposition applications require high deposition rates. The primary limiting pa...
Reactive sputtering is one of the widely used techniques to prepare compound thin films. In this stu...
This contribution deals with design, check and test of deposition parameters for new installed alumi...
Diploma thesis describes technology of pulse reactive magnetron sputtering of Al2O3 coating. Further...
The high optical characteristics of aluminium films made them attractive for different functional an...
It has been shown already that pulsed reactive magnetron sputtering (PMS) allows to deposit crystall...
The deposition rate of reactively sputtered Al2O3 coatings is demonstrated to increase by 80% upon t...
Alumina (Al2O3) thin films were deposited on Si (100) by Magnetron Sputtering in reactive conditions...
International audienceThe deposition rate of reactively sputtered Al2O3 coatings is demonstrated to ...
International audiencen this work, AlNxOy thin films were deposited by reactive magnetron sputtering...
Thin films of Al2O3 and AlN have been fabricated by reactive sputtering using magnetron sputtering e...
Aluminum oxide thin films were prepared by medium frequency reactive magnetron sputtering. The targe...
Aluminum oxide is used in many applications as hard coating, for example on cutting tools. In additi...
Al and Al2O3 films were deposited by RF magnetron sputtering using a mixed gas of Ar and O2. The sur...
In the further development of reactive sputter deposition, strategies which allow for stabilization ...
Many reactive sputter deposition applications require high deposition rates. The primary limiting pa...
Reactive sputtering is one of the widely used techniques to prepare compound thin films. In this stu...