Pfeiffer W, Deicher M, Keller R, et al. Characterization of Cd Implanted and Annealed GaAS and InP by Perturbed Angular Correlation (PAC) Spectroscopy. Appl. Surf. Sci. 1991;50(1-4):154-158.Investigations of Cd-111m implanted GaAs and InP crystals using the microscopically sensitive perturbed angular correlation technique show that the implanted Cd is incorporated on unperturbed substitutional lattice sites during rapid thermal annealing at significant lower temperatures than for electrical activation is required. In GaAs the higher implantation temperature at 473 K did not show any influence on this annealing stage, whereas a higher implantation dose hinders the annealing. We conclude that not only the local environment of the implant bu...
Carbon was implanted into GaAs at the energy of 1 MeV with doses between 131013 and 2 31015 cm22 at ...
Changes in electrical properties and crystal structure due to MeV, heavy-ion implants in GaAs have b...
A detailed study of the influence of substrate temperature on the radiation-induced lattice strain f...
Pfeiffer W, Deicher M, Kalish R, et al. Annealing of damage in GaAs and InP after implantation of Cd...
Pfeiffer W, Deicher M, Keller R, et al. Cd-H pairs in GaAs: identification and stability. Appl. Phys...
The local lattice environment of the donor In in CdS is investigated measuring the electric-field gr...
The relationship between electrical activity, dopant solubility, and diffusivity was investigated as...
The recovery of crystallinity as a function of annealing temperature in GaP recoil-implanted with111...
Electronic properties of Si and Mg implants in undoped semi-insulating GaAs are studied. The activat...
Cd in GaAs is an acceptor atom and has the largest atomic diameter among the four commonly-used grou...
Cadmium ions were implanted in GaAs crystals at 135 keV to doses ranging from 1012 to 1016 ion/cm2 a...
The structural relaxation of irradiated III-V compound semiconductors InP, GaAs and InAs arising fro...
Rapid thermal processing of implanted GaAs reveals a definitive sequence in the damage annealing and...
An experimental study of lattice disordering, the crystalline-to-amorphous (c-a) phase transition, a...
170-174Single crystal GaAs substrates implanted with 70 MeV 120Sn have been investigated by X-ray di...
Carbon was implanted into GaAs at the energy of 1 MeV with doses between 131013 and 2 31015 cm22 at ...
Changes in electrical properties and crystal structure due to MeV, heavy-ion implants in GaAs have b...
A detailed study of the influence of substrate temperature on the radiation-induced lattice strain f...
Pfeiffer W, Deicher M, Kalish R, et al. Annealing of damage in GaAs and InP after implantation of Cd...
Pfeiffer W, Deicher M, Keller R, et al. Cd-H pairs in GaAs: identification and stability. Appl. Phys...
The local lattice environment of the donor In in CdS is investigated measuring the electric-field gr...
The relationship between electrical activity, dopant solubility, and diffusivity was investigated as...
The recovery of crystallinity as a function of annealing temperature in GaP recoil-implanted with111...
Electronic properties of Si and Mg implants in undoped semi-insulating GaAs are studied. The activat...
Cd in GaAs is an acceptor atom and has the largest atomic diameter among the four commonly-used grou...
Cadmium ions were implanted in GaAs crystals at 135 keV to doses ranging from 1012 to 1016 ion/cm2 a...
The structural relaxation of irradiated III-V compound semiconductors InP, GaAs and InAs arising fro...
Rapid thermal processing of implanted GaAs reveals a definitive sequence in the damage annealing and...
An experimental study of lattice disordering, the crystalline-to-amorphous (c-a) phase transition, a...
170-174Single crystal GaAs substrates implanted with 70 MeV 120Sn have been investigated by X-ray di...
Carbon was implanted into GaAs at the energy of 1 MeV with doses between 131013 and 2 31015 cm22 at ...
Changes in electrical properties and crystal structure due to MeV, heavy-ion implants in GaAs have b...
A detailed study of the influence of substrate temperature on the radiation-induced lattice strain f...