Stress and strain in an AlN film grown on Si (111) substrate have been evaluated by measuring Raman frequency shifts. Mechanical properties and phonon deformation potentials of AlN are evaluated by first principles calculations. The calculation model is verified by comparing the calculated Raman frequencies and frequencies detected from a bulk single crystal. Results show that the two sets of frequencies agree very well with each other. Thus, with the same verified model and parameters, elastic constants and phonon deformation potentials are calculated. Additionally, we successfully develop a numerical model to verify the calculation above and the model itself is also useful to predict properties of crystal films. Finally, the stress, strai...
International audienceIn this work, aluminium nitride (AlN) films were deposited on silicon substrat...
This paper reports optical and nanomechanical properties of predominantly a-axis oriented AlN thin f...
Piezoelectric deformations of thin, aluminum nitride (AlN) layers, on top of a silicon substrate, we...
Epitaxial growth of AlN has been performed by molecular beam epitaxy (MBE) with ammonia. The structu...
Raman spectroscopy was used to characterize the residual stress and defect density of AlN thin films...
We introduce a temperature dependent anisotropic model for the stresses in gallium nitride (GaN) and...
Nanoindentation measurements along with atomic force microscopy, X-ray diffraction, and residual str...
International audienceA scalable manufacturing method is demonstrated for the transfer of crystallin...
Aluminium nitride (AlN) is one of the leading piezoelectric materials for commercial bulk acoustic w...
Phonon frequencies of a high-quality AlN layer coherently grown on a 6H-SiC (0001) substrate are inv...
We report the comprehensive spectroscopic results of AlN thin films deposited on the A-, R- and C-su...
The stress distribution in bulk AlN crystals seeded on 6H–SiC was theoretically modeled and also det...
A comprehensive spectroscopic study is reported for MOCVD (Metal organic chemical vapor deposition) ...
Abstract — Intrinsic stress and electromechanical coupling coefficient are the most important parame...
International audienceIn this work, aluminium nitride (AlN) films were deposited on silicon substrat...
This paper reports optical and nanomechanical properties of predominantly a-axis oriented AlN thin f...
Piezoelectric deformations of thin, aluminum nitride (AlN) layers, on top of a silicon substrate, we...
Epitaxial growth of AlN has been performed by molecular beam epitaxy (MBE) with ammonia. The structu...
Raman spectroscopy was used to characterize the residual stress and defect density of AlN thin films...
We introduce a temperature dependent anisotropic model for the stresses in gallium nitride (GaN) and...
Nanoindentation measurements along with atomic force microscopy, X-ray diffraction, and residual str...
International audienceA scalable manufacturing method is demonstrated for the transfer of crystallin...
Aluminium nitride (AlN) is one of the leading piezoelectric materials for commercial bulk acoustic w...
Phonon frequencies of a high-quality AlN layer coherently grown on a 6H-SiC (0001) substrate are inv...
We report the comprehensive spectroscopic results of AlN thin films deposited on the A-, R- and C-su...
The stress distribution in bulk AlN crystals seeded on 6H–SiC was theoretically modeled and also det...
A comprehensive spectroscopic study is reported for MOCVD (Metal organic chemical vapor deposition) ...
Abstract — Intrinsic stress and electromechanical coupling coefficient are the most important parame...
International audienceIn this work, aluminium nitride (AlN) films were deposited on silicon substrat...
This paper reports optical and nanomechanical properties of predominantly a-axis oriented AlN thin f...
Piezoelectric deformations of thin, aluminum nitride (AlN) layers, on top of a silicon substrate, we...