Over the years, there has been increasing interest in the integration of metal hole array (MHA) with optoelectronic devices, as a result of enhanced coupling of incident light into the active layer of devices via surface plasmon polariton (SPP) resonances. However, not all incident light contributes to the SPP resonances due to significant reflection loss at the interface between incident medium and MHA. Conventional thin-film antireflection (AR) coating typically does not work well due to non-existing material satisfying the AR condition with strong dispersion of MHA’s effective impedances. We demonstrate a single-layer metasurface AR coating that completely eliminates the refection and significantly increases the transmission at the SPP r...
Metamaterials, in the form of perfect absorbers, have recently received attention for sensing and li...
International audienceA longstanding and fundamental ambition of waves science is the achievement of...
Degradation in image contrast becomes a concern at higher numerical apertures (NA) due to mask induc...
Over the years, there has been increasing interest in the integration of metal hole array (MHA) with...
Over the years, there has been increasing interest in the integration of metal hole array (MHA) with...
We have studied several metamaterials structures with multiple layers by explaining them theoretical...
We have studied several metamaterials structures with multiple layers by explaining them theoretical...
The energy efficiency of optoelectronic components and devices is critically dependent on minimizing...
Metamaterials are artificial metallic structures having, possibly, simultaneously negative permittiv...
In this manuscript, we propose a metasurface approach for the reduction of electromagnetic reflectio...
International audienceWe compute the reflectance properties of a metasurface that consists of a doub...
Reflection is usually a detrimental phenomenon in many applications such as flat-panel-displays, sol...
In this manuscript, we propose a metasurface approach for the reduction of electromagnetic reflectio...
dissertationPlasmonic metasurfaces offer a unique capability to manipulate amplitude, phase and/or p...
Degradation in image contrast becomes a concern at higher numerical apertures (NA) due to mask induc...
Metamaterials, in the form of perfect absorbers, have recently received attention for sensing and li...
International audienceA longstanding and fundamental ambition of waves science is the achievement of...
Degradation in image contrast becomes a concern at higher numerical apertures (NA) due to mask induc...
Over the years, there has been increasing interest in the integration of metal hole array (MHA) with...
Over the years, there has been increasing interest in the integration of metal hole array (MHA) with...
We have studied several metamaterials structures with multiple layers by explaining them theoretical...
We have studied several metamaterials structures with multiple layers by explaining them theoretical...
The energy efficiency of optoelectronic components and devices is critically dependent on minimizing...
Metamaterials are artificial metallic structures having, possibly, simultaneously negative permittiv...
In this manuscript, we propose a metasurface approach for the reduction of electromagnetic reflectio...
International audienceWe compute the reflectance properties of a metasurface that consists of a doub...
Reflection is usually a detrimental phenomenon in many applications such as flat-panel-displays, sol...
In this manuscript, we propose a metasurface approach for the reduction of electromagnetic reflectio...
dissertationPlasmonic metasurfaces offer a unique capability to manipulate amplitude, phase and/or p...
Degradation in image contrast becomes a concern at higher numerical apertures (NA) due to mask induc...
Metamaterials, in the form of perfect absorbers, have recently received attention for sensing and li...
International audienceA longstanding and fundamental ambition of waves science is the achievement of...
Degradation in image contrast becomes a concern at higher numerical apertures (NA) due to mask induc...