International audienceParticle fallout in cleanrooms is a primary concern for industries manufacturing critical products with surfaces highly susceptible to particulate contamination. Limited research has been conducted to measure the deposited particles in cleanroom. In the frame of the ISO 14644-3, this paper compares the traditional technique for particle fallout measurements using witness plates to a real-time and in situ measurement done by an innovative device: CLEAPART-100. The CLEAPART-100 detects the same contamination event as optical counters detect. The comparison with the settle plates observed under a microscope shows the loss of particles using that indirect measurement which is unacceptable for an accurate risk analysis asse...
The heavy duty Particle Measurement Programme (PMP) inter-laboratory exercise consists of three part...
Recently, toxicological and epidemiological studies on health effects related to particle exposure s...
In a real office environment hardcopy devices are a known source of ultra-fine particles. Registrati...
International audienceParticle fallout in cleanrooms is a primary concern for industries manufacturi...
Until now the emphasis in contamination control and monitoring under cleanroom conditions has mainly...
When performing manual handling steps, operators generate and emit varying quantities of contaminati...
The cleanroom suitability as an acceptance criteria of equipment gets more and more important for th...
In the various fields of clean manufacturing such as the food industry, pharmaceutics, coating techn...
The performance of cleanrooms is still mainly defined by classification of the air cleanliness in re...
In Europe and Asia, vehicle emissions regulations include a number limit for particles larger than 2...
The Particle Cleanliness Validation System (PCVS) is a combination of a surface particle collection ...
Particle emissions f rom clean room gas-handling components were measured by following a test method...
A sampler that detects and counts ‘viable’ particles in the air of cleanrooms in real-time was studi...
Background: Nanoparticle emission assessment technique was developed to semi-quantitatively evaluate...
Nanoparticle emission assessment technique was developed to semi-quantitatively evaluate nanomateria...
The heavy duty Particle Measurement Programme (PMP) inter-laboratory exercise consists of three part...
Recently, toxicological and epidemiological studies on health effects related to particle exposure s...
In a real office environment hardcopy devices are a known source of ultra-fine particles. Registrati...
International audienceParticle fallout in cleanrooms is a primary concern for industries manufacturi...
Until now the emphasis in contamination control and monitoring under cleanroom conditions has mainly...
When performing manual handling steps, operators generate and emit varying quantities of contaminati...
The cleanroom suitability as an acceptance criteria of equipment gets more and more important for th...
In the various fields of clean manufacturing such as the food industry, pharmaceutics, coating techn...
The performance of cleanrooms is still mainly defined by classification of the air cleanliness in re...
In Europe and Asia, vehicle emissions regulations include a number limit for particles larger than 2...
The Particle Cleanliness Validation System (PCVS) is a combination of a surface particle collection ...
Particle emissions f rom clean room gas-handling components were measured by following a test method...
A sampler that detects and counts ‘viable’ particles in the air of cleanrooms in real-time was studi...
Background: Nanoparticle emission assessment technique was developed to semi-quantitatively evaluate...
Nanoparticle emission assessment technique was developed to semi-quantitatively evaluate nanomateria...
The heavy duty Particle Measurement Programme (PMP) inter-laboratory exercise consists of three part...
Recently, toxicological and epidemiological studies on health effects related to particle exposure s...
In a real office environment hardcopy devices are a known source of ultra-fine particles. Registrati...