The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer’s design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser.Fil: Capeluto, Maria Gabriela. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Física; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argenti...
Adaptive optics is concerned with the correction of phase distortions in wavefronts which degrade th...
Quality assurance for the production of optical components for extreme ultraviolet lithography (EUVL...
A dedicated interferometric microimaging system has been designed and build to produce a magnified, ...
We present the design of phase shift interferometer for the extreme ultraviolet (EUV) that will be u...
Extreme ultraviolet lithography (EUVL) is a candidate technology for the microelectronics industry w...
Extreme ultraviolet projection lithography operating at a wavelength of 13nm requires surface figure...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
EUV lithography is a promising and viable candidate for circuit fabrication with 0.1-micron critical...
We present a new interferometer technique whereby multiple extreme ultraviolet light pulses are gene...
While interferometry is routinely used for the characterization and alignment of lithographic optics...
A previously reported interferometer without intermediate optics is used to perform measurements on ...
Since 1993, research in the fabrication of extreme ultraviolet (EUV) optical imaging systems, conduc...
Aspheric mirrors for extreme ultraviolet lithography (EUVL) at a wavelength of 13nm require surface ...
Subject of this contribution is a laser interferometer for absolute distance measurement (ADI) in a ...
Adaptive optics is concerned with the correction of phase distortions in wavefronts which degrade th...
Quality assurance for the production of optical components for extreme ultraviolet lithography (EUVL...
A dedicated interferometric microimaging system has been designed and build to produce a magnified, ...
We present the design of phase shift interferometer for the extreme ultraviolet (EUV) that will be u...
Extreme ultraviolet lithography (EUVL) is a candidate technology for the microelectronics industry w...
Extreme ultraviolet projection lithography operating at a wavelength of 13nm requires surface figure...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
EUV lithography is a promising and viable candidate for circuit fabrication with 0.1-micron critical...
We present a new interferometer technique whereby multiple extreme ultraviolet light pulses are gene...
While interferometry is routinely used for the characterization and alignment of lithographic optics...
A previously reported interferometer without intermediate optics is used to perform measurements on ...
Since 1993, research in the fabrication of extreme ultraviolet (EUV) optical imaging systems, conduc...
Aspheric mirrors for extreme ultraviolet lithography (EUVL) at a wavelength of 13nm require surface ...
Subject of this contribution is a laser interferometer for absolute distance measurement (ADI) in a ...
Adaptive optics is concerned with the correction of phase distortions in wavefronts which degrade th...
Quality assurance for the production of optical components for extreme ultraviolet lithography (EUVL...
A dedicated interferometric microimaging system has been designed and build to produce a magnified, ...