We present an improved methodology to calibrate nominal SPICE models to individual or average PCM measurements at the die, wafer or lot level. The method overcomes previous difficulties in the structured handling of huge amounts of PCM data and it is validated in a state-of-the-art mixed-signal system-on-chip product development environment for the 65 nm CMOS technology node. The proposed approach is especially useful for real time process control to tackle model-hardware correlation problems in a multi-foundry design environment, to ease the burden of transferring designs to new production sites and to complement common tools available to the designers to cope with process variability such as worst-case corner models and Monte Carlo simula...
A statistical metrology methodology has been developed and used to study the contributions to spatia...
With the rapid scaling down of the semiconductor process technology, the process variation aware cir...
Nowadays the highest device integration affects the design process in several ways. The process vari...
We present an improved methodology to calibrate nominal SPICE models to individual or average PCM me...
PCM test structures are commonly used to check the produced wafers from the standpoint of the techno...
A SPICE model of Phase Change Memory (PCM) is developed based on a proposed analytical resistance mo...
Process variability is a major challenge for the design of nano scale MOSFETs due to fundamental phy...
Integrated Circuit (IC) designers have always faced the problem of small deviations in parameters of...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
Rapid development of a well controlled manufacturing process is a key component of marketplace succe...
Thesis: M. Eng. in Advanced Manufacturing and Design, Massachusetts Institute of Technology, Departm...
Empirical thesis.Bibliography: pages 185-196.1. Introduction -- 2. Overview -- 3.Chua's circuit anal...
[[abstract]]For sub-9Onm technology nodes and below, random fluctuations of within-die physical proc...
International audienceAdvanced CMOS devices are increasingly affected by various kinds of process va...
Advanced CMOS devices are increasingly affected by various kinds of process variations. Whereas the ...
A statistical metrology methodology has been developed and used to study the contributions to spatia...
With the rapid scaling down of the semiconductor process technology, the process variation aware cir...
Nowadays the highest device integration affects the design process in several ways. The process vari...
We present an improved methodology to calibrate nominal SPICE models to individual or average PCM me...
PCM test structures are commonly used to check the produced wafers from the standpoint of the techno...
A SPICE model of Phase Change Memory (PCM) is developed based on a proposed analytical resistance mo...
Process variability is a major challenge for the design of nano scale MOSFETs due to fundamental phy...
Integrated Circuit (IC) designers have always faced the problem of small deviations in parameters of...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
Rapid development of a well controlled manufacturing process is a key component of marketplace succe...
Thesis: M. Eng. in Advanced Manufacturing and Design, Massachusetts Institute of Technology, Departm...
Empirical thesis.Bibliography: pages 185-196.1. Introduction -- 2. Overview -- 3.Chua's circuit anal...
[[abstract]]For sub-9Onm technology nodes and below, random fluctuations of within-die physical proc...
International audienceAdvanced CMOS devices are increasingly affected by various kinds of process va...
Advanced CMOS devices are increasingly affected by various kinds of process variations. Whereas the ...
A statistical metrology methodology has been developed and used to study the contributions to spatia...
With the rapid scaling down of the semiconductor process technology, the process variation aware cir...
Nowadays the highest device integration affects the design process in several ways. The process vari...