Fabrication of micro separation column for miniaturized gas chromatography system

The emphasis of this work is on the fabrication of a micro separation column for applicaton in miniaturized gas chromatography system. The micro column was made by microchannels fabricated on the silicon wafer and sealed with a glass lid. The microchannels were fabricated by wet etching process and the channels were of length 2m , width 200 μm and depth 100 μm. The channels were closed by sealing with Pyrex glass. Silicide bonding was done for the bonding of silicon with Pyrex glass. Ti was used as an intermediate layer and bonded at a temperature of 377 ◦C and a force of 1kN. During bonding Ti forms an alloy with silicon and forms Titanium silicide and this helps to bond the glass wafer with silicom wafer with microchannels etched on it