We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (poly-Si) by chemical vapor deposition from trichlorosilane at temperatures between 740 and 870 ºC. By using scanning electron microscopy an average grain size lower than 0.4 μm was observed, with a columnar structure suitable for the electrical conduction in photovoltaic cells. X-ray diffraction reveals a strong (2 2 0) preferential orientation of the films, which is indicative of a low density of intra-grain defects. Atomic force microscope images reveal a conical structure, with a root mean square roughness of 65 nm for samples of around 3 μm in thickness. This natural texture is a positive characteristic from the point of view of light trap...
Although the deposition of crystalline silicon on a glass substrate has been pursued using hot wire ...
Although the deposition of crystalline silicon on a glass substrate has been pursued using hot wire ...
[[abstract]]This paper presents the results of low temperature polycrystalline silicon growth on SiO...
We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (p...
We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (p...
We deposited polycrystalline silicon (poly-Si) thin films on commercial float glass by chemical vapo...
International audienceWe deposited polycrystalline silicon (poly-Si) thin films on commercial float ...
International audienceWe deposited polycrystalline silicon (poly-Si) thin films on commercial float ...
Atmospheric pressure (AP) thermal CVD is used to deposit thin poly-Si films on glass substrates. Als...
In this chapter, we present an overview of the state of the art in different deposition and processi...
In the search for sustainable energy sources, solar energy can fulfil a large part of the growing de...
Deposition of polycrystalline silicon by thermolysis of silane, SiH₄, is a common technique for crea...
We have demonstrated that a polycrystalline silicon thin film can be fabricated in situ on soda-lime...
Large grain polycrystalline silicon thin film on low cost and robust substrate is an interesting ar...
Polycrystalline silicon (poly-Si) films(similar to 10 mu m) were grown from dichlorosilane by a rapi...
Although the deposition of crystalline silicon on a glass substrate has been pursued using hot wire ...
Although the deposition of crystalline silicon on a glass substrate has been pursued using hot wire ...
[[abstract]]This paper presents the results of low temperature polycrystalline silicon growth on SiO...
We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (p...
We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (p...
We deposited polycrystalline silicon (poly-Si) thin films on commercial float glass by chemical vapo...
International audienceWe deposited polycrystalline silicon (poly-Si) thin films on commercial float ...
International audienceWe deposited polycrystalline silicon (poly-Si) thin films on commercial float ...
Atmospheric pressure (AP) thermal CVD is used to deposit thin poly-Si films on glass substrates. Als...
In this chapter, we present an overview of the state of the art in different deposition and processi...
In the search for sustainable energy sources, solar energy can fulfil a large part of the growing de...
Deposition of polycrystalline silicon by thermolysis of silane, SiH₄, is a common technique for crea...
We have demonstrated that a polycrystalline silicon thin film can be fabricated in situ on soda-lime...
Large grain polycrystalline silicon thin film on low cost and robust substrate is an interesting ar...
Polycrystalline silicon (poly-Si) films(similar to 10 mu m) were grown from dichlorosilane by a rapi...
Although the deposition of crystalline silicon on a glass substrate has been pursued using hot wire ...
Although the deposition of crystalline silicon on a glass substrate has been pursued using hot wire ...
[[abstract]]This paper presents the results of low temperature polycrystalline silicon growth on SiO...