A new type of ultra-cold ion source is under development which employs transverse laser cooling and compression of a thermal atomic rubidium beam followed by photo-ionization. The resulting ultra-cold plasma is focused to a nanometer-sized spot using an existing Focused Ion Beam column and this spot can be used for the fabrication of nano-structures. Simulations of a 10 cm long laser-cooling stage and of disorder-induced heating of the resulting ion beam, predict an achievable brightness for87Rb+ of order 107 A/m2 sr eV at an longitudinal energy spread of less than 1 eV and a current of tens of pA, which is substantially better than conventional ion sources. Experimental realization of the compact ion source has recently started with the de...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
Since from their initial introduction, laser-cooling techniques have been proposed as a viable appro...
High-brightness ion sources are important for several applications such as focussed ion beam (FIB) s...
A new type of ultra-cold ion source is under development which employs transverse laser cooling and ...
A new type of ultra-cold ion source is under development which employs transverse laser cooling and ...
A new type of ultra-cold ion source is under development which employs transverse laser cooling and ...
A new type of high-brightness ion source is under development which employs transverse laser cooling...
A new type of high-brightness ion source is under development which employs transverse laser cooling...
A new type of high-brightness ion source is under development which employs transverse laser cooling...
Ultra-low temperature (1 mK) ion beams can be created by photo-ionization of a laser cooled and comp...
Ultra-low temperature (1 mK) ion beams can be created by photo-ionization of a laser cooled and comp...
Ultra-low temperature (1 mK) ion beams can be created by photo-ionization of a laser cooled and comp...
Focused ion beam instruments a"re indispensable tools for the semiconductor industry due to their ab...
Focused ion beam instruments a re indispensable tools for the semiconductor industry due to their ab...
UltraCold Ion Beam Source. Focused ion beam (FIB) machines are largely used in the semiconductor ind...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
Since from their initial introduction, laser-cooling techniques have been proposed as a viable appro...
High-brightness ion sources are important for several applications such as focussed ion beam (FIB) s...
A new type of ultra-cold ion source is under development which employs transverse laser cooling and ...
A new type of ultra-cold ion source is under development which employs transverse laser cooling and ...
A new type of ultra-cold ion source is under development which employs transverse laser cooling and ...
A new type of high-brightness ion source is under development which employs transverse laser cooling...
A new type of high-brightness ion source is under development which employs transverse laser cooling...
A new type of high-brightness ion source is under development which employs transverse laser cooling...
Ultra-low temperature (1 mK) ion beams can be created by photo-ionization of a laser cooled and comp...
Ultra-low temperature (1 mK) ion beams can be created by photo-ionization of a laser cooled and comp...
Ultra-low temperature (1 mK) ion beams can be created by photo-ionization of a laser cooled and comp...
Focused ion beam instruments a"re indispensable tools for the semiconductor industry due to their ab...
Focused ion beam instruments a re indispensable tools for the semiconductor industry due to their ab...
UltraCold Ion Beam Source. Focused ion beam (FIB) machines are largely used in the semiconductor ind...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
Since from their initial introduction, laser-cooling techniques have been proposed as a viable appro...
High-brightness ion sources are important for several applications such as focussed ion beam (FIB) s...