Cl2-based inductively coupled plasma etching of photonic crystals in InP

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Deep dry etching process development for photonic crystals in InPbased planar waveguides

Van der Heijden, R. (author)
Andriesse, M.S.P. (author)
Carlström, C.F. (author)
Van der Drift, E. (author)
Geluk, E.J. (author)
Van der Heijden, R.W. (author)
Karouta, F. (author)
Nouwens, P. (author)
Siang Oei, Y. (author)
De Vries, T. (author)

September 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlström, C.F.
Van der Heijden, R.
Andriesse, M.S.P.
Karouta, F.
Van der Heijden, R.W.
Van der Drift, E.W.J.M.
Salemink, H.W.M.

September 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlstrom, CFV
Heijden, RW Rob van der
Andriesse, MSP
Karouta, F Fouad
Heijden, RW Rob van der
Drift, EWJM van der
Salemink, HWM

January 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlström, C.F.V.
Heijden, van der, R.
Andriesse, M.S.P.
Karouta, F.
Heijden, van der, R.W.
Drift, van der, E.W.J.M.
Salemink, H.W.M.

January 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlström, C.F. (author)
Van der Heijden, R. (author)
Andriesse, M.S.P. (author)
Karouta, F. (author)
Van der Heijden, R.W. (author)
Van der Drift, E.W.J.M. (author)
Salemink, H.W.M. (author)

September 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...

Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals

Wang HL
Xing MX
Ren G
Zheng WH
Zheng WH Chinese Acad Sci Inst Semicond Nanooptoelect Lab Beijing 100083 Peoples R China. E-mail Address: whzheng@red.semi.ac.cn

January 2009

The authors developed an inductively coupled plasma etching process for the fabrication of hole-type...

Cl2-based inductively coupled plasma etching of photonic crystals in InP

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Cl2-based inductively coupled plasma etching of photonic crystals in InP

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Deep dry etching process development for photonic crystals in InPbased planar waveguides

Van der Heijden, R. (author)
Andriesse, M.S.P. (author)
Carlström, C.F. (author)
Van der Drift, E. (author)
Geluk, E.J. (author)
Van der Heijden, R.W. (author)
Karouta, F. (author)
Nouwens, P. (author)
Siang Oei, Y. (author)
De Vries, T. (author)

September 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlström, C.F.
Van der Heijden, R.
Andriesse, M.S.P.
Karouta, F.
Van der Heijden, R.W.
Van der Drift, E.W.J.M.
Salemink, H.W.M.

September 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlstrom, CFV
Heijden, RW Rob van der
Andriesse, MSP
Karouta, F Fouad
Heijden, RW Rob van der
Drift, EWJM van der
Salemink, HWM

January 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlström, C.F.V.
Heijden, van der, R.
Andriesse, M.S.P.
Karouta, F.
Heijden, van der, R.W.
Drift, van der, E.W.J.M.
Salemink, H.W.M.

January 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Carlström, C.F. (author)
Van der Heijden, R. (author)
Andriesse, M.S.P. (author)
Karouta, F. (author)
Van der Heijden, R.W. (author)
Van der Drift, E.W.J.M. (author)
Salemink, H.W.M. (author)

September 2008

An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...

Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals

Wang HL
Xing MX
Ren G
Zheng WH
Zheng WH Chinese Acad Sci Inst Semicond Nanooptoelect Lab Beijing 100083 Peoples R China. E-mail Address: whzheng@red.semi.ac.cn

January 2009

The authors developed an inductively coupled plasma etching process for the fabrication of hole-type...

Cl2-based inductively coupled plasma etching of photonic crystals in InP

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Cl2-based inductively coupled plasma etching of photonic crystals in InP

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Heijden, van der, R.
Andriesse, M.S.P.
Carlstrom, C.F.
Drift, van der, E.W.J.M.
Geluk, E.J.
Heijden, van der, R.W.
Karouta, F.
Nouwens, P.A.M.
Oei, Y.S.
Vries, de, T.
Salemink, H.W.M.

January 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Deep dry etching process development for photonic crystals in InPbased planar waveguides

Van der Heijden, R. (author)
Andriesse, M.S.P. (author)
Carlström, C.F. (author)
Van der Drift, E. (author)
Geluk, E.J. (author)
Van der Heijden, R.W. (author)
Karouta, F. (author)
Nouwens, P. (author)
Siang Oei, Y. (author)
De Vries, T. (author)

September 2004

Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

Carlström, C.F.
van der Heijden, R.
Kok, A.A.M.
van der Heijden, R.W.
Karouta, F.
van der Tol, J.J.G.M.
Nötzel, R.
van Veldhoven, P. J.
Salemink, H.W.M.

December 2005

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied ...

Cl2-based inductively coupled plasma etching of photonic crystals in InP

Abstract

Extracted data

Cl2-based inductively coupled plasma etching of photonic crystals in InP

Abstract

Extracted data

Related items

Related items