Plasma treatment apparatus for treating a substrate (6) comprising at least two opposing electrodes (2, 3) and a treatment space (5). The at least two electrodes (2, 3) are connected to a plasma control unit (4) for generating an atmospheric pressure glow discharge plasma in the treatment space (5). A gas supply device (8) provides a gas mixture in the treatment space (5). In operation,a first layer of inorganic material is deposited on a polymeric substrate using a gas composition comprising oxygen having a concentration of 2 % or less, while the power supply provides an energy of 30 J/cm2 or less. A second layer of inorganic material is deposited on the first layer using a gas composition comprising oxygen having a concentration of 3 % or...
WO 200236851 A UPAB: 20020919 NOVELTY - To process the surface(s) of at least one electrically insul...
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice t...
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice t...
Plasma treatment apparatus for treating a substrate (6) comprising at least two opposing electrodes ...
Substrate with gas barrier layer system comprises: a substrate (1); a plasma polymer layer deposited...
Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment spac...
Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment spac...
An apparatus suitable for plasma surface treating (e.g., forming a membrane layer on a substrate sur...
A cold plasma prototype electrode discharge apparatus to perform polymer surface treatment is descri...
WO 200292871 A UPAB: 20030204 NOVELTY - Device for coating and/or surface treating substrates using ...
DE 10322696 B UPAB: 20050207 NOVELTY - Plasma-assisted treatment of predetermined surface areas of a...
The invention relates to an apparatus suitable for plasma surface treating (e.g. forming a membrane ...
In a method and device for treating a substrate by means of a plasma, the plasma is generated and ac...
WO 200236851 A UPAB: 20020919 NOVELTY - To process the surface(s) of at least one electrically insul...
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice t...
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice t...
Plasma treatment apparatus for treating a substrate (6) comprising at least two opposing electrodes ...
Substrate with gas barrier layer system comprises: a substrate (1); a plasma polymer layer deposited...
Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment spac...
Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment spac...
An apparatus suitable for plasma surface treating (e.g., forming a membrane layer on a substrate sur...
A cold plasma prototype electrode discharge apparatus to perform polymer surface treatment is descri...
WO 200292871 A UPAB: 20030204 NOVELTY - Device for coating and/or surface treating substrates using ...
DE 10322696 B UPAB: 20050207 NOVELTY - Plasma-assisted treatment of predetermined surface areas of a...
The invention relates to an apparatus suitable for plasma surface treating (e.g. forming a membrane ...
In a method and device for treating a substrate by means of a plasma, the plasma is generated and ac...
WO 200236851 A UPAB: 20020919 NOVELTY - To process the surface(s) of at least one electrically insul...
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice t...
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice t...