The possibility to prepare and use submicrometer-sized patterns in successive functionalization reactions with quaternary ammonium salts and (functional) chlorosilanes, as well as cationic gold nanoparticles, is presented. Submicrometer-sized structures were prepared by local probe oxidation of octadecyl trichlorosilane functionalized silicon wafers. By this method, patterns were oxidized with 40-nm resolution, which can be used in local surface functionalization reactions. The principle of subsequent functionalization, either with additional quaternary ammonium salts or by a polymer grafting reaction, has been demonstrated
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The local oxidation of self-assembled monolayers with a scanning probe is a promising method for the...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The octadecyl trichlorosilane (OTS) monolayer was formed on Si carrier, and the template regulated b...
The octadecyl trichlorosilane (OTS) monolayer was formed on Si carrier, and the template regulated b...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The local oxidation of self-assembled monolayers with a scanning probe is a promising method for the...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The possibility to prepare and use submicrometer-sized patterns in successive functionalization reac...
The octadecyl trichlorosilane (OTS) monolayer was formed on Si carrier, and the template regulated b...
The octadecyl trichlorosilane (OTS) monolayer was formed on Si carrier, and the template regulated b...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The size regime for devices produced by photolithographic techniques is limited. Therefore, other pa...
The local oxidation of self-assembled monolayers with a scanning probe is a promising method for the...