Concerted experiments and theoretical analysis are applied to conclusively demonstrate the vacancy generation during fast melting and regrowth of Si by laser irradiation. Experiments, based on the positron annihilation spectroscopy and designed to test the theoretical predictions, evidence a vacancy supersaturation after the laser process depending on the irradiation conditions. Stochastic atomistic simulations of the molten Si recrystallization show trapping of vacancies in the recrystallized region. Finally, continuum phase-field simulations of the full process, calibrated using the Monte Carlo results, show a defect evolution in close agreement with the experiments.Peer reviewe
cited By 1International audienceThe formation of extended defects and their impact on dopant activat...
New insight into damage formation in Si(100) during self-ion irradiation is gained from processing u...
The distribution and annealing behavior of the vacancy-type defects and displaced Si atoms in crysta...
Concerted experiments and theoretical analysis are applied to conclusively demonstrate the vacancy g...
Liquid phase epitaxial regrowth following laser melting significantly modifies the concentration of ...
In a series of experiments, Chantre et al. measured vacancy--phosphorus pairs after laser annealing ...
Nanosecond pulsed laser melting can be used to rapidly recrystallize ion-implanted Si through liquid...
This work presents a multiscale approach to understanding the defect formation during the evolution ...
Ion implantation followed by pulsed laser melting is an extensively-studied method for hyperdoping S...
Symposium Theme: Amorphous and microcrystalline silicon technologyWe show how positron annihilation ...
Defect evolution and dopant dynamics in boron implanted silicon under excimer laser irradiation is i...
Positron annihilation was used to characterize vacancy-type defects in two types of polycrystalline...
High-energy Si implantation into silicon creates a net defect distribution that is characterized by ...
Nous présentons une revue des travaux consacrés à l'étude des défauts ponctuels observés par des mes...
Ion scattering and channelling measurements show that the rapid liquid phase epitaxial recrystalliza...
cited By 1International audienceThe formation of extended defects and their impact on dopant activat...
New insight into damage formation in Si(100) during self-ion irradiation is gained from processing u...
The distribution and annealing behavior of the vacancy-type defects and displaced Si atoms in crysta...
Concerted experiments and theoretical analysis are applied to conclusively demonstrate the vacancy g...
Liquid phase epitaxial regrowth following laser melting significantly modifies the concentration of ...
In a series of experiments, Chantre et al. measured vacancy--phosphorus pairs after laser annealing ...
Nanosecond pulsed laser melting can be used to rapidly recrystallize ion-implanted Si through liquid...
This work presents a multiscale approach to understanding the defect formation during the evolution ...
Ion implantation followed by pulsed laser melting is an extensively-studied method for hyperdoping S...
Symposium Theme: Amorphous and microcrystalline silicon technologyWe show how positron annihilation ...
Defect evolution and dopant dynamics in boron implanted silicon under excimer laser irradiation is i...
Positron annihilation was used to characterize vacancy-type defects in two types of polycrystalline...
High-energy Si implantation into silicon creates a net defect distribution that is characterized by ...
Nous présentons une revue des travaux consacrés à l'étude des défauts ponctuels observés par des mes...
Ion scattering and channelling measurements show that the rapid liquid phase epitaxial recrystalliza...
cited By 1International audienceThe formation of extended defects and their impact on dopant activat...
New insight into damage formation in Si(100) during self-ion irradiation is gained from processing u...
The distribution and annealing behavior of the vacancy-type defects and displaced Si atoms in crysta...