The microstructural features, magnetic, nanomechanical properties and wettability behaviors of Iron-Palladium (FePd) alloy thin films are investigated by using X-ray diffraction (XRD), atomic force microscopy (AFM), vibrating sample magnetometer (VSM), nanoindentation and water contact angle (CA) techniques, respectively. The FePd alloy thin films were deposited on glass substrates using a magnetron sputtering system. The post-annealing processes of FePd alloy thin films were carried out at 400 °C and 750 °C and resulted in a significant increase of both the average grain size and surface roughness. The XRD analysis showed that FePd alloy thin films exhibited a predominant (111) orientation. The magnetic field dependence of magnetization of...
Sputtering and electrodeposition are among the most widespread techniques for metallic thin film dep...
Sputtering and electrodeposition are among the most widespread techniques for metallic thin film dep...
Fe50Pd50 thin films (t = 50nm) have been deposited on Si substrates covered with a native oxide laye...
FePd alloys in the thin film form represent a multipurpose and versatile material with relevant chem...
FePd alloys in the thin film form represent a multipurpose and versatile material with relevant chem...
Bimetallic nanomaterials in the form of thin film constituted by magnetic and noble elements show pr...
Bimetallic nanomaterials in the form of thin film constituted by magnetic and noble elements show pr...
Ferromagnetic FePd L $1_{0}$ ordered alloys are highly expected as forthcoming high-density recordin...
FePd alloys in the thin film form represent a multipurpose and versatile material with relevant chem...
To study the structural, thermal, electrical, optical, and adhesive properties of magnetic FePdB thi...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Fe-Pd alloys containing about 30 at.% Pd are promising magnetic shape memory alloys and hence draw m...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Sputtering and electrodeposition are among the most widespread techniques for metallic thin film dep...
Sputtering and electrodeposition are among the most widespread techniques for metallic thin film dep...
Fe50Pd50 thin films (t = 50nm) have been deposited on Si substrates covered with a native oxide laye...
FePd alloys in the thin film form represent a multipurpose and versatile material with relevant chem...
FePd alloys in the thin film form represent a multipurpose and versatile material with relevant chem...
Bimetallic nanomaterials in the form of thin film constituted by magnetic and noble elements show pr...
Bimetallic nanomaterials in the form of thin film constituted by magnetic and noble elements show pr...
Ferromagnetic FePd L $1_{0}$ ordered alloys are highly expected as forthcoming high-density recordin...
FePd alloys in the thin film form represent a multipurpose and versatile material with relevant chem...
To study the structural, thermal, electrical, optical, and adhesive properties of magnetic FePdB thi...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Fe-Pd alloys containing about 30 at.% Pd are promising magnetic shape memory alloys and hence draw m...
Nanostructured Pd-Fe thin films with varied Fe content were prepared by electrodeposition technique ...
Sputtering and electrodeposition are among the most widespread techniques for metallic thin film dep...
Sputtering and electrodeposition are among the most widespread techniques for metallic thin film dep...
Fe50Pd50 thin films (t = 50nm) have been deposited on Si substrates covered with a native oxide laye...