Ultrafast Ablation with High-Pulse-Rate Lasers. Part I: Theoretical Considerations

A novel ultrafast pulsed laser deposition (PLD) which eliminates film contamination was developed. Cluster or droplet contamination from the laser plumes are removed due to the low number of atoms evaporated per laser pulse. Furthermore, the nanosecond pulse duration transition to picosecond pulse duration increases the evaporation rate. The efficiency of the system is tested on the growth of amorphous carbon thin films