A new experimental method of studying shifts between concentration-versus-depth profiles of vacancy-type and interstitial-type defects in ion-implanted silicon is demonstrated. The concept is based on deep level transient spectroscopy (DLTS) measurement
A deep level transient spectroscopy (DLTS) study of defects created by low-fluence, low-energy ion-i...
The ion mass effect on the dominating vacancy related deep levels in Cz-Si implanted with 4-MeV C io...
International audienceLow-energy implantation is one of the most promising options for ultrashallow ...
An experimental method of studying shifts between concentration-versus-depth profiles of vacancy- an...
An experimental concept of studying shifts between concentration-versus-depth profiles of vacancy an...
A combination of high resolution Laplace deep level transient spectroscopy (LDLTS) and direct captur...
Abstract In this paper we present an overview of the deep states present after ion-implantation by v...
We have carried out high resolution Laplace deep level transient Spectroscopy (DLTS) and conventiona...
In this paper we present an overview of the deep states present after ion-implantation by various sp...
Deep Level Transient Spectroscopy (DLTS) has been used to study defects formed in bulk silicon after...
International audienceIt is well established that low energy B+ ion implantation into Ge- (or Si) im...
International audienceIn this work, we focused on the analysis of implantation-induced defects, main...
The effect of implantation angle on the profile of the vacancy-phosphorus and divacancy centres (VP/...
Deep-level defects remaining in the upper half of the band-gap of silicon implanted with protons at ...
Deep level transient spectroscopy (DLTS) has been used to study vacancy-related defects formed in bu...
A deep level transient spectroscopy (DLTS) study of defects created by low-fluence, low-energy ion-i...
The ion mass effect on the dominating vacancy related deep levels in Cz-Si implanted with 4-MeV C io...
International audienceLow-energy implantation is one of the most promising options for ultrashallow ...
An experimental method of studying shifts between concentration-versus-depth profiles of vacancy- an...
An experimental concept of studying shifts between concentration-versus-depth profiles of vacancy an...
A combination of high resolution Laplace deep level transient spectroscopy (LDLTS) and direct captur...
Abstract In this paper we present an overview of the deep states present after ion-implantation by v...
We have carried out high resolution Laplace deep level transient Spectroscopy (DLTS) and conventiona...
In this paper we present an overview of the deep states present after ion-implantation by various sp...
Deep Level Transient Spectroscopy (DLTS) has been used to study defects formed in bulk silicon after...
International audienceIt is well established that low energy B+ ion implantation into Ge- (or Si) im...
International audienceIn this work, we focused on the analysis of implantation-induced defects, main...
The effect of implantation angle on the profile of the vacancy-phosphorus and divacancy centres (VP/...
Deep-level defects remaining in the upper half of the band-gap of silicon implanted with protons at ...
Deep level transient spectroscopy (DLTS) has been used to study vacancy-related defects formed in bu...
A deep level transient spectroscopy (DLTS) study of defects created by low-fluence, low-energy ion-i...
The ion mass effect on the dominating vacancy related deep levels in Cz-Si implanted with 4-MeV C io...
International audienceLow-energy implantation is one of the most promising options for ultrashallow ...