Raman spectroscopy was used to analyze structural modifications of monocrystalline Ge implanted with 3 × 1012 to 3 × 1016 cm-274Ge ions, at either room temperature (RT) or liquid nitrogen (LN) temperature. In all implanted samples, beyond the amorphiza
Ge nanocrystals formed in a SiO2 matrix by ion implantation were studied by Raman spectroscopy. It i...
[[abstract]]The structural evolution in Ge+ implantation amorphous Si has been investigated by high-...
Si1-xGex layers were formed through high-dose germanium ion implantation into (100)Si substrates. Tw...
Extended X-ray absorption fine structure and Raman spectroscopy have been utilised to measure implan...
Implantation-induced, microstructural modifications including increased bond length and non-Gaussian...
Effect of RF plasma treatment (RFPT) and rapid thermal annealing (RTA) on high-dose implanted n-type...
RF hydrogen plasma treatment, rapid thermal annealing and thermal annealing of high-dose implanted a...
Low-temperature structural relaxation in amorphized Ge has been characterized by extended x-ray-abso...
Changes in the elastic properties of Ge induced by room-temperature irradiation with 3.5-MeV Kr ions...
The structure of implantation-induced damage in Ge has been investigated using high resolution exten...
The structure of ion implantation-induced damage in Ge substrates has been investigated with a combi...
Ge nanocrystals were formed in Al2O3 matrix by implantation of Ge ions into sapphire (alpha-Al2O3) s...
International audienceThe controlled doping of germanium by ion implantation is a process which requ...
Ge nanocrystals (NCs) grown by ion implantation in amorphous silica matrices were irradiated with 5 ...
Swift heavy ion (SHI) irradiation of amorphous Si (a-Si) at non-perpendicular incidence leads to non...
Ge nanocrystals formed in a SiO2 matrix by ion implantation were studied by Raman spectroscopy. It i...
[[abstract]]The structural evolution in Ge+ implantation amorphous Si has been investigated by high-...
Si1-xGex layers were formed through high-dose germanium ion implantation into (100)Si substrates. Tw...
Extended X-ray absorption fine structure and Raman spectroscopy have been utilised to measure implan...
Implantation-induced, microstructural modifications including increased bond length and non-Gaussian...
Effect of RF plasma treatment (RFPT) and rapid thermal annealing (RTA) on high-dose implanted n-type...
RF hydrogen plasma treatment, rapid thermal annealing and thermal annealing of high-dose implanted a...
Low-temperature structural relaxation in amorphized Ge has been characterized by extended x-ray-abso...
Changes in the elastic properties of Ge induced by room-temperature irradiation with 3.5-MeV Kr ions...
The structure of implantation-induced damage in Ge has been investigated using high resolution exten...
The structure of ion implantation-induced damage in Ge substrates has been investigated with a combi...
Ge nanocrystals were formed in Al2O3 matrix by implantation of Ge ions into sapphire (alpha-Al2O3) s...
International audienceThe controlled doping of germanium by ion implantation is a process which requ...
Ge nanocrystals (NCs) grown by ion implantation in amorphous silica matrices were irradiated with 5 ...
Swift heavy ion (SHI) irradiation of amorphous Si (a-Si) at non-perpendicular incidence leads to non...
Ge nanocrystals formed in a SiO2 matrix by ion implantation were studied by Raman spectroscopy. It i...
[[abstract]]The structural evolution in Ge+ implantation amorphous Si has been investigated by high-...
Si1-xGex layers were formed through high-dose germanium ion implantation into (100)Si substrates. Tw...