Photoluminescence (PL) imaging identifies contamination occurring in thermal oxidation of p-type crystalline silicon. PL images indicate that the contamination decreases the carrier lifetime from ∼350 to 50 μs and that it is radially symmetric with a
Photoluminescence (PL) imaging techniques can be applied to multicrystalline silicon wafers througho...
N-type multicrystalline silicon (mc-Si) is a promising alternative to the dominant p-type mc-Si for ...
Experiments have been conducted to understand the behaviour of iron in silicon containing oxide prec...
We have extended the development of a recent interstitial iron imaging technique based on photolumin...
Vacuum-evaporated iron caused a severe degradation in minority carrier lifetime irrespective of the ...
Photoluminescence imaging is able to provide quantitative information about carrier lifetime in sili...
We present high-resolution images of the lateral distribution of interstitial iron across wafers fro...
This work reports on state-of-the-art silicon material characterization by calibrated photoluminesce...
This work reports on state-of-the-art silicon material characterization by calibrated photoluminesce...
Several combinations of oxidation and phosphorus diffusion processes suitable for silicon solar cell...
Iron-related defects are deleterious in silicon-based integrated circuits and photovoltaics, ruining...
Thin thermal oxide film (∼36 nm) was grown on p--Si (100) wafers in a vertical furnace at 950 °C for...
This paper introduces a photoluminescence-based technique for determining the acceptor concentration...
International audienceHerein, silicon substrates intentionally contaminated by iron and copper are a...
Abstract—Photoluminescence-based imaging is most commonly used to measure the excess minority carrie...
Photoluminescence (PL) imaging techniques can be applied to multicrystalline silicon wafers througho...
N-type multicrystalline silicon (mc-Si) is a promising alternative to the dominant p-type mc-Si for ...
Experiments have been conducted to understand the behaviour of iron in silicon containing oxide prec...
We have extended the development of a recent interstitial iron imaging technique based on photolumin...
Vacuum-evaporated iron caused a severe degradation in minority carrier lifetime irrespective of the ...
Photoluminescence imaging is able to provide quantitative information about carrier lifetime in sili...
We present high-resolution images of the lateral distribution of interstitial iron across wafers fro...
This work reports on state-of-the-art silicon material characterization by calibrated photoluminesce...
This work reports on state-of-the-art silicon material characterization by calibrated photoluminesce...
Several combinations of oxidation and phosphorus diffusion processes suitable for silicon solar cell...
Iron-related defects are deleterious in silicon-based integrated circuits and photovoltaics, ruining...
Thin thermal oxide film (∼36 nm) was grown on p--Si (100) wafers in a vertical furnace at 950 °C for...
This paper introduces a photoluminescence-based technique for determining the acceptor concentration...
International audienceHerein, silicon substrates intentionally contaminated by iron and copper are a...
Abstract—Photoluminescence-based imaging is most commonly used to measure the excess minority carrie...
Photoluminescence (PL) imaging techniques can be applied to multicrystalline silicon wafers througho...
N-type multicrystalline silicon (mc-Si) is a promising alternative to the dominant p-type mc-Si for ...
Experiments have been conducted to understand the behaviour of iron in silicon containing oxide prec...