Structural characterization of Ge nanocrystals in silica amorphised by ion irradiation
- Araujo, Leandro
- Giulian, Raquel
- Johannessen, Bernt
- Llewellyn, David
- Kluth, Patrick
- Azevedo, G de M
- Cookson, D J
- Ridgway, Mark C
Publication date
December 2015
DOI Publisher
Elsevier BV Journal
Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated EquipmentAbstract
Ge nanocrystals (NCs) grown by ion implantation in amorphous silica matrices were irradiated with 5 MeV Si ions over a different fluence range (2 × 1011-2 × 1013 cm-2) than previously reported. Size and depth distributions as well as structural disorde
Add to ORKG