[[alternative]]Processes of Soft-Mold Ultraviolet Lithography

碩士顯示技術研究所[[abstract]]本實驗使用紫外光軟模仁轉印微影技術(Soft UV-NIL)，光阻選擇PAK-01，利用聚二甲基矽氧烷(PDMS)具可撓性及高透光性的優點，在室溫低壓下，將PDMS軟模仁上的圖案結構轉印到塑膠基板(PET)上，並嘗試以不同濃度之光阻進行轉印，探討其可行性。本實驗在可撓性塑膠基板上完成700nm之柱狀結構，這個轉印結構可應用在生醫檢測方面，因奈米柱狀物能增加抗原與抗體的反應面積；也可應用在光學元件方面，如微流道、次波長光柵、光子晶體。 紫外光固化型轉印微影技術，製程過程中無需加熱的步驟，製程時間短暫且製程條件容易，配合PDMS軟模仁材料特性的優勢，不需脫模劑即可達到良好的脫模效果，使整個轉印過程簡單快速，達到高量產的優勢。[[abstract]]We use soft ultraviolet nanoimprint lithography (Soft UV-NIL), at room temperature and low-pressure, the miniature patterns are imprinted on the plastic substrate, polyethylene terephthalate (PET). The polydimethylsiloxane (PDMS) with the flexible and transparent advantages is suitable for mold. On the other hand, we use isopropyl ether (IPE) to dilute the UV-NIL resist (PAK-01) and research its feasibility. 700-nm pillar structures on plastic substrates are achieved. These structures can be applied to biomedical sensors because the nano pillars can increase the area of the reaction between antigens and antibody. Furthermore, these structures also can be applied to optical components such as microfluidics, sub-wavelength gratings, and photonic crystals. The UV-cured nanoimprint lithography has the advantages of room-temperature step, short process time, and simple operation. With the advantages of the PDMS soft mold, the mold releasing process does not need any release agent. The entire process is simple and fast