This paper reports the fabrication of bulk molybdenum field emitter arrays with integrated, self-aligned gates. Based on molybdenum deep reactive ion etching, the fabrication process is significantly simplified compared with that of conventional Spindt-type arrays. In the present structures, the distance between the gate and emitter has been precisely controlled by the thickness of SiO2 dielectric layer. In this work, current densities of 8.4mA/cm(2) were produced from a uniform array of 2500 tips covering a total emission area of just 1 mm(2), driven at gate-emitter voltages of just 120 V. Compared to diode-type emitters we reported elsewhere [1], the emission current densities increased by 240 times to 33.6nA/tip, owing to the extractor g...
Specially designed silicon gated field emitter array (SiGFEA) tips are used as large current electro...
A new process for, gated silicon field emitter arrays fabrication is presented. The fabrication proc...
Monolayer molybdenum disulfide (MoS2) nanosheets, obtained via chemical vapor deposition onto SiO2/S...
This paper reports the fabrication of bulk molybdenum field emitter arrays with integrated, self-ali...
We report on the fabrication of highly uniform field emitter arrays (FEAs) with an integrated self-a...
We report on the fabrication of highly uniform field emitter arrays (FEAs) with an integrated self-a...
This paper reports a simple technology for fabricating high aspect ratio (>10) field emission tip...
This paper reports a simple technology for fabricating high aspect ratio (>10) field emission tip...
In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bu...
In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bu...
A self-aligned process was developed for the fabrication of gated Si field emission devices with pre...
A technique for fabricating self-aligned gate structures onto pre-existing silicon field emitter arr...
Double-gate field-emission characteristics of metallic field-emitter-array (FEA) cathodes fabricated...
Out-of-plane focusing is essential for electron beam collimation in gated field emission sources. Th...
We report the fabrication and field emission properties of high-density nano-emitter arrays with on-...
Specially designed silicon gated field emitter array (SiGFEA) tips are used as large current electro...
A new process for, gated silicon field emitter arrays fabrication is presented. The fabrication proc...
Monolayer molybdenum disulfide (MoS2) nanosheets, obtained via chemical vapor deposition onto SiO2/S...
This paper reports the fabrication of bulk molybdenum field emitter arrays with integrated, self-ali...
We report on the fabrication of highly uniform field emitter arrays (FEAs) with an integrated self-a...
We report on the fabrication of highly uniform field emitter arrays (FEAs) with an integrated self-a...
This paper reports a simple technology for fabricating high aspect ratio (>10) field emission tip...
This paper reports a simple technology for fabricating high aspect ratio (>10) field emission tip...
In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bu...
In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bu...
A self-aligned process was developed for the fabrication of gated Si field emission devices with pre...
A technique for fabricating self-aligned gate structures onto pre-existing silicon field emitter arr...
Double-gate field-emission characteristics of metallic field-emitter-array (FEA) cathodes fabricated...
Out-of-plane focusing is essential for electron beam collimation in gated field emission sources. Th...
We report the fabrication and field emission properties of high-density nano-emitter arrays with on-...
Specially designed silicon gated field emitter array (SiGFEA) tips are used as large current electro...
A new process for, gated silicon field emitter arrays fabrication is presented. The fabrication proc...
Monolayer molybdenum disulfide (MoS2) nanosheets, obtained via chemical vapor deposition onto SiO2/S...