In this investigation,we have presented the StressInduced Leakage Current(SILC) phenomenon in ultrathin gate oxide p-MOSFET under FN high field stress.The SILC in ultrathin gate oxide is proportional to exp(β·E_(ox)).The SILC plot of ln(J_(SILC)) versus Eox is linear.The intercept and slope of th...In this investigation,we have presented the StressInduced Leakage Current(SILC) phenomenon in ultrathin gate oxide p-MOSFET under FN high field stress.The SILC in ultrathin gate oxide is proportional to exp(β·E_(ox)).The SILC plot of ln(J_(SILC)) versus Eox is linear.The intercept and slope of th...Chinese Institute of Electronics(CIE)、IEEE Beijing Section4Vol.
研究了不同厚度的超薄栅1.9nm到3.0nm器件在恒压应力下的栅电流变化.实验结果显示应力诱导漏电流包括两个部分,一部分是由界面陷阱辅助隧穿引起的,另一部分是氧化物陷阱辅助隧穿引起的.国家重点基础研究...
Stress induced leakage current (SILC) is one of the main problems in ultra-thin oxide MOS devices be...
Stress-induced leakage current (SILC) is one of the major problems found in ultra-thin oxides before...
In this investigation, we have presented the Stress-induced Leakage Current (SILC) phenomenon in ult...
A number of groups have reported that the low-field stress-induced leakage current (SILC) in thin ox...
A study of the gate current variation is presented for various thickness ultrathin gate oxides rangi...
International audienceStress Induced Leakage Currents (SILC) are studied in 5 nm-thick oxides on bot...
Constant current stress induced leakage currents are studied in very thin oxide devices, for both st...
This thesis will explore the various oxide degradations induced by the electric field stress in 51A ...
Stress-induced leakage current (SILC) of ultrathin gate oxide was investigated by observing the gene...
In this work we have investigated the behaviour of ultra thin gate oxide subjected to pulsed voltage...
International audienceWe have studied the electric field and temperature dependence of stress induce...
SILC (stress induced leakage current) is the phenomenon of abnormal increase in low field gate curre...
International audienceWe have studied the electric field and temperature dependence of stress induce...
International audienceIn this study, we report on the electrical properties of the stress induced le...
研究了不同厚度的超薄栅1.9nm到3.0nm器件在恒压应力下的栅电流变化.实验结果显示应力诱导漏电流包括两个部分,一部分是由界面陷阱辅助隧穿引起的,另一部分是氧化物陷阱辅助隧穿引起的.国家重点基础研究...
Stress induced leakage current (SILC) is one of the main problems in ultra-thin oxide MOS devices be...
Stress-induced leakage current (SILC) is one of the major problems found in ultra-thin oxides before...
In this investigation, we have presented the Stress-induced Leakage Current (SILC) phenomenon in ult...
A number of groups have reported that the low-field stress-induced leakage current (SILC) in thin ox...
A study of the gate current variation is presented for various thickness ultrathin gate oxides rangi...
International audienceStress Induced Leakage Currents (SILC) are studied in 5 nm-thick oxides on bot...
Constant current stress induced leakage currents are studied in very thin oxide devices, for both st...
This thesis will explore the various oxide degradations induced by the electric field stress in 51A ...
Stress-induced leakage current (SILC) of ultrathin gate oxide was investigated by observing the gene...
In this work we have investigated the behaviour of ultra thin gate oxide subjected to pulsed voltage...
International audienceWe have studied the electric field and temperature dependence of stress induce...
SILC (stress induced leakage current) is the phenomenon of abnormal increase in low field gate curre...
International audienceWe have studied the electric field and temperature dependence of stress induce...
International audienceIn this study, we report on the electrical properties of the stress induced le...
研究了不同厚度的超薄栅1.9nm到3.0nm器件在恒压应力下的栅电流变化.实验结果显示应力诱导漏电流包括两个部分,一部分是由界面陷阱辅助隧穿引起的,另一部分是氧化物陷阱辅助隧穿引起的.国家重点基础研究...
Stress induced leakage current (SILC) is one of the main problems in ultra-thin oxide MOS devices be...
Stress-induced leakage current (SILC) is one of the major problems found in ultra-thin oxides before...