Interface roughness effects on tunneling currentin ultrathin MOS structures are investigatedtheoretically. The roughness at SiO_2/Si interface isdescribed in terms of Gauss distribution.It is shownthat the effects of rough surface on tunneling currentcan not be neglected while tunneling occurs. T...Interface roughness effects on tunneling currentin ultrathin MOS structures are investigatedtheoretically. The roughness at SiO_2/Si interface isdescribed in terms of Gauss distribution.It is shownthat the effects of rough surface on tunneling currentcan not be neglected while tunneling occurs. T...Chinese Institute of Electronics(CIE)、IEEE Beijing Section
Effects of direct tunneling and surface roughness on the capacitance-voltage characteristics of ultr...
Effects of direct tunneling and surface roughness on the capacitance-voltage characteristics of ultr...
The Si/Si02 interface roughness has important effects on the performance of metal-oxide semiconducto...
Interface roughness effects on tunneling current in ultrathin MOS structures are investigated theore...
In many theoretical investigations of the electric-tunnel effect through an ultrathin oxide in metal...
Interface roughness effects on direct tunneling current in ultrathin MOSFETs are investigated by num...
With the aggressive scaling down of MOS, the direct tunneling current will replace FN tunneling as t...
The effects of interface roughness on the amplitudes of Fowler-Nordheim (FN) tunneling current oscil...
Interface roughness effects on quantum oscillations in ultrathin metal-oxide-semiconductor held tran...
Advanced MOSFET for ULSI and novel silicon-based devices require the use of ultrathin tunneling oxid...
97 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2003.Si/SiO2 interface roughness ha...
研究了粗糙界面对电子隧穿超薄栅金属-氧化物-半导体场效应晶体管的氧化层的影响.对于栅厚为3nm的超薄栅MOS结构的界面用高斯粗糙面进行模拟来获取界面粗糙度对直接隧穿电流的影响,数值模拟的结果表明:界面...
The impact of the surface roughness on the gate tunneling and capacitance of ultra-thin gate dielect...
The current–voltage characteristics of n+ poly-Si/SiO2/p-Si tunnel structures containing nonuniform ...
As design rules shrink to conform with ULSI device dimensions, gate dielectrics for MOSFET structure...
Effects of direct tunneling and surface roughness on the capacitance-voltage characteristics of ultr...
Effects of direct tunneling and surface roughness on the capacitance-voltage characteristics of ultr...
The Si/Si02 interface roughness has important effects on the performance of metal-oxide semiconducto...
Interface roughness effects on tunneling current in ultrathin MOS structures are investigated theore...
In many theoretical investigations of the electric-tunnel effect through an ultrathin oxide in metal...
Interface roughness effects on direct tunneling current in ultrathin MOSFETs are investigated by num...
With the aggressive scaling down of MOS, the direct tunneling current will replace FN tunneling as t...
The effects of interface roughness on the amplitudes of Fowler-Nordheim (FN) tunneling current oscil...
Interface roughness effects on quantum oscillations in ultrathin metal-oxide-semiconductor held tran...
Advanced MOSFET for ULSI and novel silicon-based devices require the use of ultrathin tunneling oxid...
97 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2003.Si/SiO2 interface roughness ha...
研究了粗糙界面对电子隧穿超薄栅金属-氧化物-半导体场效应晶体管的氧化层的影响.对于栅厚为3nm的超薄栅MOS结构的界面用高斯粗糙面进行模拟来获取界面粗糙度对直接隧穿电流的影响,数值模拟的结果表明:界面...
The impact of the surface roughness on the gate tunneling and capacitance of ultra-thin gate dielect...
The current–voltage characteristics of n+ poly-Si/SiO2/p-Si tunnel structures containing nonuniform ...
As design rules shrink to conform with ULSI device dimensions, gate dielectrics for MOSFET structure...
Effects of direct tunneling and surface roughness on the capacitance-voltage characteristics of ultr...
Effects of direct tunneling and surface roughness on the capacitance-voltage characteristics of ultr...
The Si/Si02 interface roughness has important effects on the performance of metal-oxide semiconducto...