Formation of ultralow-reflectance silicon surface by dry etching

In this study, a one-step method of fabricating nano to micro structures was reported. Monte Carlo (MC) simulation and a fluid equation were employed to study the formation and evolution mechanism. To verify the fundamental simulation and hypothetical mechanism, standard surface technology (STS) was used with a phase delay producer to build the etching system. Also, throughout the practical experiment, the relationship between the structure scale and the process parameter was recorded. Lastly, the reflectance was measured to be only 0.9%, proving that this method was very promising for optical application. (C) 2015 The Japan Society of Applied Physics973 program [0211CB309502]SCI(E)EIARTICLEcharlair@126.com4,SI5