C60/n-GaN contacts have been fabricated by depositing solid C60 on n-GaN films, and their electrical properties were measured. We find that the contact is a strongly rectifying heterojunction with a rectification ratio greater than 106, and its ideal factor is close to 1. Current-temperature measurement shows an exponential dependence of current on reciprocal temperature, from which the effective barrier height is determined to be 0.535 eV. The series resistance measured decreases with the increase of the forward voltage and finally tends to be a constant value.EI04333-3372
Heterojunctions of solid C70 and n- or p-type crystalline Si have been made. Current-voltage measure...
For the determination of specific contact resistance in semiconductor devices, it is usually assumed...
In recent years, a significant progress has been made in the development of III-V Nitrides based dev...
Current-voltage measurements show that C60/n-GaN, C70/n-GaN and C70/p-GaN contacts have very good re...
The electrical properties of the heterojunction of solid C60/n-type GaAs were studied. The results o...
Heterojunction of solid C70 and p-type crystalline Si has been made. Current-voltage measurement sho...
Abstract The forward current–voltage (I–V) characteristics of n-GaN films on sapphire substrate are ...
Solid C70/GaAs contacts were fabricated by vacuum deposition of solid C70 films on the n-type and p-...
Solid C60/p-type GaAs heterojunctions have been made by deposition of solid C60 film on the epitaxia...
We describe experiments investigating the quality of ohmic contacts to both bulk GaN and to III-nitr...
Abstract. GaN films are prepared by MOCVD method on a sapphire substrate. The sample is n-type an se...
Solid C60/GaAs contacts were fabricated by growing solid C60 films on both n-type and p-type GaAs(10...
The electrical properties of metal-GaN heterostructures due to the defects and nanoscale surface inh...
The electrical and structural properties of Ti/W/Au ohmic contacts to moderately doped n-GaN (4.07 x...
We report on the formation of thermally stable and low-resistance Ti/Au-based ohmic contacts to n-ty...
Heterojunctions of solid C70 and n- or p-type crystalline Si have been made. Current-voltage measure...
For the determination of specific contact resistance in semiconductor devices, it is usually assumed...
In recent years, a significant progress has been made in the development of III-V Nitrides based dev...
Current-voltage measurements show that C60/n-GaN, C70/n-GaN and C70/p-GaN contacts have very good re...
The electrical properties of the heterojunction of solid C60/n-type GaAs were studied. The results o...
Heterojunction of solid C70 and p-type crystalline Si has been made. Current-voltage measurement sho...
Abstract The forward current–voltage (I–V) characteristics of n-GaN films on sapphire substrate are ...
Solid C70/GaAs contacts were fabricated by vacuum deposition of solid C70 films on the n-type and p-...
Solid C60/p-type GaAs heterojunctions have been made by deposition of solid C60 film on the epitaxia...
We describe experiments investigating the quality of ohmic contacts to both bulk GaN and to III-nitr...
Abstract. GaN films are prepared by MOCVD method on a sapphire substrate. The sample is n-type an se...
Solid C60/GaAs contacts were fabricated by growing solid C60 films on both n-type and p-type GaAs(10...
The electrical properties of metal-GaN heterostructures due to the defects and nanoscale surface inh...
The electrical and structural properties of Ti/W/Au ohmic contacts to moderately doped n-GaN (4.07 x...
We report on the formation of thermally stable and low-resistance Ti/Au-based ohmic contacts to n-ty...
Heterojunctions of solid C70 and n- or p-type crystalline Si have been made. Current-voltage measure...
For the determination of specific contact resistance in semiconductor devices, it is usually assumed...
In recent years, a significant progress has been made in the development of III-V Nitrides based dev...