A new measurement method on 1/F noise of wafer level

In this paper, a new robust measureement method and setup on the 1/f noise of wafer level is developed. The developed test setup was constructed of the Keithley series of instruments including Keithley Instrument 4200-SCS, Keithley Instrument 428 and a low pass filter. A Keithley software of Automation Characterization Suite (ACS) was applied to control the operation of measurement instruments and to acquire/analyze the measured data. Since the adopted low pass filter can remove any higher frequency noises than 0.5 Hz, the measurement accuracy on the 1/f noise is significantly improved. Using the setup, the 1/f noise characteristics of NMOS and PMOS devices with different sizes under different bias conditions can be evaluated.EI