Stress induced leakage current (SILO) has been discussed for a long time by many researchers. The oxide traps are believed to be the cause of SILO but characterization of these traps is still not clear. In this paper, we demonstrate that the SILO related oxide traps can be distinguished into two kinds with different characterization parameter by PDO method. Linear fitting also shows that double oxide trap model is better than single oxide trap model. (C) 2004 Published by Elsevier Ltd.http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000224520600033&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8e1609b174ce4e31116a60747a720701Engineering, Electrical & ElectronicPhysic...
We present a novel experimental technique to identify the energy of traps responsible for the stress...
Stress-induced leakage current (SILC) has been recognized as a topic of concern in flash memory reli...
We have investigated the time stability of low-field Stress Induced Leakage Current (SILC) in thin o...
SILC (stress induced leakage current) is the phenomenon of abnormal increase in low field gate curre...
A new quantitative model of the stress induced leakage current (SILC) in MOS capacitors with thin ox...
A number of groups have reported that the low-field stress-induced leakage current (SILC) in thin ox...
In ultra-thin oxides Stress Induced Leakage Current (SILC) is measured at low oxide fields after ele...
In this investigation, we have presented the Stress-induced Leakage Current (SILC) phenomenon in ult...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
Low-field leakage current has been measured in ultra thin oxides (tox=3 nm) after Constant Current S...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
Constant current stress induced leakage currents are studied in very thin oxide devices, for both st...
In ultra-thin oxides Stress Induced Leakage Current (SILC) is measured at low oxide fields after ele...
In this work we have shown that stress induced leakage current (SILC) in thin oxides can be effectiv...
In this paper, we develop a detailed physical model to interpret the dependence of the stress induce...
We present a novel experimental technique to identify the energy of traps responsible for the stress...
Stress-induced leakage current (SILC) has been recognized as a topic of concern in flash memory reli...
We have investigated the time stability of low-field Stress Induced Leakage Current (SILC) in thin o...
SILC (stress induced leakage current) is the phenomenon of abnormal increase in low field gate curre...
A new quantitative model of the stress induced leakage current (SILC) in MOS capacitors with thin ox...
A number of groups have reported that the low-field stress-induced leakage current (SILC) in thin ox...
In ultra-thin oxides Stress Induced Leakage Current (SILC) is measured at low oxide fields after ele...
In this investigation, we have presented the Stress-induced Leakage Current (SILC) phenomenon in ult...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
Low-field leakage current has been measured in ultra thin oxides (tox=3 nm) after Constant Current S...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
Constant current stress induced leakage currents are studied in very thin oxide devices, for both st...
In ultra-thin oxides Stress Induced Leakage Current (SILC) is measured at low oxide fields after ele...
In this work we have shown that stress induced leakage current (SILC) in thin oxides can be effectiv...
In this paper, we develop a detailed physical model to interpret the dependence of the stress induce...
We present a novel experimental technique to identify the energy of traps responsible for the stress...
Stress-induced leakage current (SILC) has been recognized as a topic of concern in flash memory reli...
We have investigated the time stability of low-field Stress Induced Leakage Current (SILC) in thin o...