The post soft breakdown (SBD) current saturation behavior was studied on the basis of electron velocity saturation concept by using the Proportional Difference Operator (PDO) method. It is shown that the proportional difference peak height and position of the post soft breakdown I-V curves are related to the saturation current density and the saturation velocity of electron in SBD path, respectively. The probable cross-section size of post SBD leakage current path in SiO2 is studied based on the defect scattering mechanism also. ? 2006 IEEE.EI
In this work, the characteristics of the substrate current to soft breakdowns (SBDs) in n-MOSFETs we...
Low-field leakage current has been measured in ultra thin oxides (tox=3 nm) after Constant Current S...
Abstract—We have investigated the properties of soft break-down (SBD) in thin oxide (4.5 nm) nMOSFET...
The physical origin of post soft breakdown (SBD) current saturation behavior of ultrathin gate oxide...
Based on the tunneling current model, a simplified current model is developed for MOS devices after ...
Defect current of ultrathin oxides after degradation and breakdown was investigated by defect band s...
We have investigated the properties of soft breakdown (SBD) in thin oxide (4.5 nm) nMOSFETs with mea...
Gate oxide Soft Breakdown (SB) can have a severe impact on MOSFET performance even when not producin...
The experimentally determined conduction mechanisms of gate leakage current are examined for two dif...
The conduction mechanism of ultra-thin gate oxide n-metal-oxide-semiconductor field effect transisto...
The characteristics of the gate current (Ig) and substrate current (Ib) of ultra-thin gate oxides (&...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
In this letter, the relationship between gate oxide degradation and defect band formation is investi...
Gate oxide soft breakdown (SB) can have a severe impact on MOSFET performance even when not producin...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
In this work, the characteristics of the substrate current to soft breakdowns (SBDs) in n-MOSFETs we...
Low-field leakage current has been measured in ultra thin oxides (tox=3 nm) after Constant Current S...
Abstract—We have investigated the properties of soft break-down (SBD) in thin oxide (4.5 nm) nMOSFET...
The physical origin of post soft breakdown (SBD) current saturation behavior of ultrathin gate oxide...
Based on the tunneling current model, a simplified current model is developed for MOS devices after ...
Defect current of ultrathin oxides after degradation and breakdown was investigated by defect band s...
We have investigated the properties of soft breakdown (SBD) in thin oxide (4.5 nm) nMOSFETs with mea...
Gate oxide Soft Breakdown (SB) can have a severe impact on MOSFET performance even when not producin...
The experimentally determined conduction mechanisms of gate leakage current are examined for two dif...
The conduction mechanism of ultra-thin gate oxide n-metal-oxide-semiconductor field effect transisto...
The characteristics of the gate current (Ig) and substrate current (Ib) of ultra-thin gate oxides (&...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
In this letter, the relationship between gate oxide degradation and defect band formation is investi...
Gate oxide soft breakdown (SB) can have a severe impact on MOSFET performance even when not producin...
The degradation of MOSFETs under high field stress has been investigated for a long time. The degrad...
In this work, the characteristics of the substrate current to soft breakdowns (SBDs) in n-MOSFETs we...
Low-field leakage current has been measured in ultra thin oxides (tox=3 nm) after Constant Current S...
Abstract—We have investigated the properties of soft break-down (SBD) in thin oxide (4.5 nm) nMOSFET...