RANGE PROFILES OF IMPLANTED ARGON IONS IN POLYMERS
- ZHAO, QT
- WANG, KM
- LIU, JT
- LIU, XD
- DENG, SM
- LIN, J
- YA, KJ
DOIAbstract
The Rutherford backscattering (RBS) technique has been used to determine the range profiles of Ar+ implanted into polymer LPPS ([(C6H5)(8)Si8O12](n)) film at energies of 50, 70, 90, 100, 120, 150 and 170 keV. It is found that the range profiles are Gaussian, and the experimental projected ranges are in a good agreement with the theoretical values calculated by TRIM'89 code at energies below 120 keV. As for range straggling, the experimental values are higher than the prediction values. In addition, a Variation in the implantation dose from 5 x 10(15) to 1 X 10(17) ions/cm(2) at 50 keV does not affect the projected range, but the range straggling increases with the increasing implanted dose. The results of the implantation of Ar+ in pol...
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