We present the results of spectroscopic measurements in the extreme ultraviolet regime (7-17 nm) of molten tin microdroplets illuminated by a high-intensity 3 J, 60 ns Nd: YAG laser pulse. The strong 13.5 nm emission from this laser-produced plasma (LPP) is of relevance for next-generation nanolithography machines. Here, we focus on the shorter wavelength features between 7 and 12 nm which have so far remained poorly investigated despite their diagnostic relevance. Using flexible atomic code calculations and local thermodynamic equilibrium arguments, we show that the line features in this region of the spectrum can be explained by transitions from high-lying configurations within the Sn8+-Sn15+ ions. The dominant transitions for all ions bu...
The afterglow emission from Nd:YAG-laser-produced microdroplet-tin plasma is investigated, with a fo...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets ...
We present the results of spectroscopic measurements in the extreme ultraviolet regime (7–17 nm) of ...
Emission spectra from multiply-charged Sn5+-Sn(10+)ions are recorded from an electron beam ion trap ...
Emission spectra from multiply-charged Sn5+-Sn10+ ions are recorded from an electron beam ion trap (...
Emission spectra from multiply-charged Sn5+–Sn10+ ions are recorded from an electron beam ion trap (...
Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) ...
Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in ...
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the ...
Laser-produced Sn plasma sources are used to generate extreme ultraviolet light in state-of-the-art ...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
The afterglow emission from Nd:YAG-laser-produced microdroplet-tin plasma is investigated, with a fo...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets ...
We present the results of spectroscopic measurements in the extreme ultraviolet regime (7–17 nm) of ...
Emission spectra from multiply-charged Sn5+-Sn(10+)ions are recorded from an electron beam ion trap ...
Emission spectra from multiply-charged Sn5+-Sn10+ ions are recorded from an electron beam ion trap (...
Emission spectra from multiply-charged Sn5+–Sn10+ ions are recorded from an electron beam ion trap (...
Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) ...
Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in ...
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the ...
Laser-produced Sn plasma sources are used to generate extreme ultraviolet light in state-of-the-art ...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
The afterglow emission from Nd:YAG-laser-produced microdroplet-tin plasma is investigated, with a fo...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets ...