Qualitative Temperature Variation Imaging by Thermoreflectance and SThM Techniques

We have studied temperature variations on two dissipative structures with two different techniques. The dissipative structures are constituted of thin (0.35µm) dissipative resistors, the distance between two resistors being equal to 0.8 or 10 µm. On one hand, we have used a thermoreflectance imaging technique which is a well-known non contact optical method to evaluate temperature variations but whose spatial resolution is limited by diffraction. On the other hand, we have used a Scanning Thermal Microscope (SThM) to study the thermal behaviour of these small dissipative structures. We compare qualitative results obtained by both methods and we present their advantages and limitations for temperature measurements on microelectronic devices