Interfacial and electrical properties of Ge MOS capacitor by ZrLaON passivation layer and fluorine incorporation
- Huang, Y
- Xu, JP
- Liu, L
- Cheng, ZX
- Lai, PT
- Tang, WM
Publication date
March 2018
DOI Publisher
IOP Publishing ISSN
1757-8981 Journal
IOP Conference Series Materials Science and EngineeringAbstract
2017 2nd International Conference on Advanced Materials Research and Manufacturing Technologies, AMRMT 2017, Phuket, Thailand, 2-5 August, 20172017-2018 > Academic research: refereed > Publication in refereed journal201803 bcmaVersion of RecordPublishe
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