This paper presents an effective approach to variability analysis of integrated capacitors due to manufacturing process uncertainty. The proposed approach combines the generalized Polynomial Chaos method for uncertainty quantification with the efficient Floating Random Walk algorithm for capacitance extraction. For applications where detailed statistical descriptions are required, the method allows achieving a 1000× acceleration compared to standard Monte Carlo analysis. Application to variability analysis in Digital to Analog Converters is illustrated
In this paper, a stochastic modeling method is presented for the analysis of variability effects, in...
An efficient method is proposed to consider the process variations with spatial correlation, for chi...
In today's semiconductor technology, the size of a transistor is made smaller and smaller. One of th...
This paper presents an effective approach to variability analysis of integrated capacitors due to ma...
Abstract—Lithographic limitations and manufacturing uncer-tainties are resulting in fabricated shape...
Advances in manufacturing process technology are key ensembles for the production of integrated circ...
In the past few decades, the semiconductor industry kept shrinking the feature size of CMOS transist...
One of the major tasks in electronic circuit design is the ability to predict the performance of gen...
This paper proposes a decoupled and iterative circuit implementation of the stochastic Galerkin meth...
In this paper we present a continuous surface model to describe the interconnect geometric variation...
This paper provides and compares two alternative solutions for the simulation of cables and intercon...
This paper provides an overview of the polynomial chaos (PC) technique applied to the statistical an...
This paper presents an alternative modeling strategy for the stochastic analysis of high-speed inter...
In this paper we present a continuous surface model to describe the interconnect geometric variation...
Abstract – In this paper, a new geometric variation model, referred to as the improved continuous su...
In this paper, a stochastic modeling method is presented for the analysis of variability effects, in...
An efficient method is proposed to consider the process variations with spatial correlation, for chi...
In today's semiconductor technology, the size of a transistor is made smaller and smaller. One of th...
This paper presents an effective approach to variability analysis of integrated capacitors due to ma...
Abstract—Lithographic limitations and manufacturing uncer-tainties are resulting in fabricated shape...
Advances in manufacturing process technology are key ensembles for the production of integrated circ...
In the past few decades, the semiconductor industry kept shrinking the feature size of CMOS transist...
One of the major tasks in electronic circuit design is the ability to predict the performance of gen...
This paper proposes a decoupled and iterative circuit implementation of the stochastic Galerkin meth...
In this paper we present a continuous surface model to describe the interconnect geometric variation...
This paper provides and compares two alternative solutions for the simulation of cables and intercon...
This paper provides an overview of the polynomial chaos (PC) technique applied to the statistical an...
This paper presents an alternative modeling strategy for the stochastic analysis of high-speed inter...
In this paper we present a continuous surface model to describe the interconnect geometric variation...
Abstract – In this paper, a new geometric variation model, referred to as the improved continuous su...
In this paper, a stochastic modeling method is presented for the analysis of variability effects, in...
An efficient method is proposed to consider the process variations with spatial correlation, for chi...
In today's semiconductor technology, the size of a transistor is made smaller and smaller. One of th...