International audienceA 2D simulation code resolving the Schrodinger and Poisson equations coupled with the ballistic transport equation in double-gate (DG) devices has been developed. This code has been used to investigate the operation of DG metal-oxide-semiconductor field-effect transistors (MOSFETs) in the decananometer range (5-20 nm) with ultrathin gate oxides and film bodies (1.5 nm). Particular emphasis is on the impact of quantum tunneling on the DG MOSFET scaling in terms of short-channel effects, off-state current, and subthreshold slope. (C) 2003 The Electrochemical Society
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
A procedure to numerically simulate quantum phenomena in double-gate (DG) MOSFET is described. The s...
33rd European Solid-State Device Research Conference, ESTORIL, PORTUGAL, SEP 16-18, 2003Internationa...
International audienceA 2D simulation code resolving the Schrodinger and Poisson equations coupled w...
4th Franco-Italian Symposium on SiO(2) and Advanced Dielectrics, TRENT, ITALY, SEP 16-18, 2002Intern...
3rd International Workshop on Ultimate Integration of Silicon, MUNICH, GERMANY, MAR 07-08, 2002Inter...
3rd International Workshop on Ultimate Integration of Silicon, MUNICH, GERMANY, MAR 07-08, 2002Inter...
In the past twenty years, the channel length of metal-oxide-semiconductor field-effect transistors (...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
Models and simulations of gate tunneling current for thin-oxide MOSFETs and Double-Gate SOIs are dis...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
Shrinking gate length in conventional MOSFETs leads to increasing short channel effects like source-...
Using self-consistent calculations of million-atom Schrodinger-Poisson equations, we investigate the...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
A procedure to numerically simulate quantum phenomena in double-gate (DG) MOSFET is described. The s...
33rd European Solid-State Device Research Conference, ESTORIL, PORTUGAL, SEP 16-18, 2003Internationa...
International audienceA 2D simulation code resolving the Schrodinger and Poisson equations coupled w...
4th Franco-Italian Symposium on SiO(2) and Advanced Dielectrics, TRENT, ITALY, SEP 16-18, 2002Intern...
3rd International Workshop on Ultimate Integration of Silicon, MUNICH, GERMANY, MAR 07-08, 2002Inter...
3rd International Workshop on Ultimate Integration of Silicon, MUNICH, GERMANY, MAR 07-08, 2002Inter...
In the past twenty years, the channel length of metal-oxide-semiconductor field-effect transistors (...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
Models and simulations of gate tunneling current for thin-oxide MOSFETs and Double-Gate SOIs are dis...
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (D...
Shrinking gate length in conventional MOSFETs leads to increasing short channel effects like source-...
Using self-consistent calculations of million-atom Schrodinger-Poisson equations, we investigate the...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
A procedure to numerically simulate quantum phenomena in double-gate (DG) MOSFET is described. The s...
33rd European Solid-State Device Research Conference, ESTORIL, PORTUGAL, SEP 16-18, 2003Internationa...