Highly-efficient low cost anisotropic wet etching of silicon wafers for solar cells application

In this work, a novel aqueous etching solution was investigated for texturization of silicon substrates. Nearly 30% of incident light is reflected from the surface of crystalline silicon due to its high refractive index. Surface texturization is an efficient practice to reduce surface reflection by enhancing light trapping. Newly formulated etching solution was evaluated for optical reflection, surface morphology and hydrophilicity of silicon substrates. Amazingly, experimental results demonstrate lowest optical reflectance, improved surface morphology as well as enhanced periodicity of the resulting pyramids. A remarkably lowest surface reflectance of 9.94% was achieved. Meanwhile, addition of IPA in the solution plays a major part in improving hydrophilicity of the silicon substrates