Raman microspectroscopy has been used to determine the volumetric micro-strain distribution in mechanically stressed silicon microstructures. Data are presented as strain images with a spatial resolution of around 0.8 µm. A useful correlation is demonstrated between finite-element analysis calculations of volumetric strain and Raman shift. The results demonstrate that silicon beam structures incorporating a 90° bend will experience a non-uniform stress distribution along the bend radius for small radii of curvature
The strain-shift coefficient used to convert Raman shifts to strain depends on multiple factors incl...
Stress measurements by Raman spectroscopy have been performed on microelectronic devices. Strain-ind...
Stress measurements by Raman spectroscopy have been performed on microelectronic devices. Strain-ind...
Raman microspectroscopy has been used to determine the volumetric micro-strain distribution in mecha...
Raman microspectroscopy has been used to determine the volumetric micro-strain distribution in mecha...
Micron-scale characterization of mechanical stresses is essential for the successful design and oper...
In this work, 100 nm-thick boron-doped silicon beams with doping levels between 1 × 1016 and 1 × 102...
State-of-the-art electronic devices are nowadays well into the nanometer regime. Raman spectroscopy ...
Test structures consisting of shallow trench isolation (STI) structures are fabricated using advance...
Test structures consisting of shallow trench isolation (STI) structures are fabricated using advance...
Test structures consisting of shallow trench isolation (STI) structures are fabricated using advance...
Flexural elastic deformations of single-crystal silicon with microspectral Raman scattering are stud...
In this paper, three techniques are discussed that provide information on process-induced local mech...
The strain-shift coefficient used to convert Raman shifts to strain depends on multiple factors incl...
Strained silicon underneath the field-effect transistor gate increases significantly the charge carr...
The strain-shift coefficient used to convert Raman shifts to strain depends on multiple factors incl...
Stress measurements by Raman spectroscopy have been performed on microelectronic devices. Strain-ind...
Stress measurements by Raman spectroscopy have been performed on microelectronic devices. Strain-ind...
Raman microspectroscopy has been used to determine the volumetric micro-strain distribution in mecha...
Raman microspectroscopy has been used to determine the volumetric micro-strain distribution in mecha...
Micron-scale characterization of mechanical stresses is essential for the successful design and oper...
In this work, 100 nm-thick boron-doped silicon beams with doping levels between 1 × 1016 and 1 × 102...
State-of-the-art electronic devices are nowadays well into the nanometer regime. Raman spectroscopy ...
Test structures consisting of shallow trench isolation (STI) structures are fabricated using advance...
Test structures consisting of shallow trench isolation (STI) structures are fabricated using advance...
Test structures consisting of shallow trench isolation (STI) structures are fabricated using advance...
Flexural elastic deformations of single-crystal silicon with microspectral Raman scattering are stud...
In this paper, three techniques are discussed that provide information on process-induced local mech...
The strain-shift coefficient used to convert Raman shifts to strain depends on multiple factors incl...
Strained silicon underneath the field-effect transistor gate increases significantly the charge carr...
The strain-shift coefficient used to convert Raman shifts to strain depends on multiple factors incl...
Stress measurements by Raman spectroscopy have been performed on microelectronic devices. Strain-ind...
Stress measurements by Raman spectroscopy have been performed on microelectronic devices. Strain-ind...